OSA International Workshop on Compact EUV & X-ray Light Sources

International Workshop on Compact EUV & X-ray Light Sources

30-31 October 2014
Omni Shoreham Hotel
Washington, DC

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Organizing Committee
Uwe ArpNational Institute of Standards and Technology
Patrick Naulleau, Lawrence Berkely National Laboratory
Planning Committee

Lahsen Assoufid, Argonne National Laboratory
Sandra Biedron, Colorado State University
Mark Curtin, Boeing
Debbie Gustafson, Energetiq
Jorge Rocca, Colorado State University
Obert Wood, Global Foundries
Stefan Wurm, SEMATECH
Wenbing Yun, Sigray, Inc.


Emerging compact extreme-ultraviolet and x-ray sources small enough to be installed in laboratories, manufacturing facilities, and hospitals will revolutionize scientific disciplines complementing large scale synchrotron radiation sources. Applications span a wide range including biomedical, semiconductor manufacturing, fundamental and applied research, environmental engineering, defense and security, and industrial non-destructive testing.
At the recent OSA Compact EUV and X-Ray Light Sources Incubator Meeting, which was held in November 2013, both light source developers and end-users, including individuals from academia, government laboratories and institutions, and industry gathered to discuss and address the scientific grand challenges and the technical challenges of sources and peripherals.  The result was an understanding of the applications, requirements, and current development status of compact sources was developed.
This follow-up two-day workshop on compact sources is to build upon the momentum and the enthusiasm created by the past OSA incubator meeting to gather both the compact light source developers, potential users, and others interested in this new field to present their work, exchange ideas, and to network with colleagues from with diverse needs and interests. The end goal is to push the technological limits, define future research directions, and build a new community of users.
In particular, the colocation with the SEMATECH 2014 International Symposium on Extreme Ultraviolet Lithography provides a unique opportunity for the EUV and X-ray light source developers to interact with the EUV lithography users, learn about their fundamental and practical needs, and assess the current status of EUV X-ray sources. The two programs will coordinate to encourage interaction / discussion between the source compact x-ray source developers and the end users. The workshop will identify the most promising source technologies for meeting future needs in areas such as lithography, actinic and non-actinic mask metrology, and wafer inspection.
Contributions to the workshop are sought in source concepts, technologies and subsystems as well in current and future potential applications. The workshop will include a few of plenary talks to motivate the discussion, yet the primary focus of the workshop will be on breakout sessions. Examples of possible breakout session topics include:
  • High average power EUV light sources
  • Ultrafast light sources and time resolved metrologies
  • Light sources for biological and medical applications
  • Hard x-ray light sources for materials characterization

Invited Speakers Include
  •  Akira Endo, HiLASE Centre
  • William Graves, Arizona State University
  • Henry Kapten, KMLabs Inc. and JILA
  • Tetsuya Makimura, Institute of Applied Physics University of Tsukuba
  • Atsushu Momose, Institute of Multidisciplinary Research for Advanced Materials, Tohoku University
  • Kazuyuki Sakaue, Waseda Institute for Advanced Study, Waseda University
  • Takashi Tanaka, RIKEN
  • Yusuke Teramoto, BLV Lict and Vakuumetechnik
  • Takayuki Uchiyama, Toshiba Corporation
  • Xiaoshi Zhang, KMLabs Inc. and JILA




Sematech logo
This workshop is collocated with the 2014 International Symposium on Extreme Ultraviolet Lithography.
The Symposium, hosted by SEMATECH in cooperation with EIDEC and imec, provides a forum to discuss and assess the worldwide status of EUVL technology and infrastructure readiness.

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imec logo