Hosted By: Thin Films Technical Group
14 May 2019, 9:30 - 10:30
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Quality control and the respective metrology play a vital role in supplying the thin film optics for next generation photonic devices. This includes in-situ and ex-situ measurement techniques to make sure specifications are met and possible mitigation strategies can be designed to react possibly even online to instabilities or control them. In general, many applications require accuracy levels in the verification of specifications that definitely can only be reached in high precision measurement systems. Specifically, optical losses or laser-induced damage threshold and precise surface conditions are characterized in specific and standardized procedures.
In this webinar, hosted by the OSA Thin Films Technical Group, Dr. Lars Jensen of Laser Zentrum Hannover will give an overview on metrology for precise and standardized quality control as well as process stability. Examples for sensitivities of the presented measurement techniques will be discussed and capabilities of the community will be summarized.
What You Will Learn:
Who Should Attend:
Lars Jensen, Laser Zentrum Hannover
Lars Jensen holds a PhD in physics from Leibniz Universität Hannover, Germany and also a Diploma in technical physics from Universität Hannover. He has more than 15 years of experience in dielectric thin films for optical applications. In the first years he developed metrology in the field of laser-induced damage and optical losses and then focused to develop thin film coatings for numerous applications in Photonics, Space, lighting and astronomy. Since 2018 he is responsible for the Laser Components department at Laser Zentrum Hannover.