High-Intensity Lasers and High-Field Phenomena


HILAS addresses all aspects of strong field phenomena from the technology of high-intensity light sources to the physics of intense light-matter interaction.

The High-Intensity Sources and High-Field Phenomena (HILAS) meeting aims to assemble a multidisciplinary community to present and exchange novel ideas and breakthrough achievements relating to the physics and technology of high field sources, and high-intensity laser-matter interaction.

The conference covers both theoretical and experimental aspects of strong-field phenomena. The latest research results in terawatt/petawatt lasers, amplification of few-cycle pulses, laser fusion technologies, EUV and X-ray sources based on lasers, high-intensity sources from the THz up to the X-ray spectral range, plasmas in ultrahigh fields, advances in attosecond science and relativistic nonlinear phenomena are among the topics to be discussed.  

Committee Members

  • Jean-Claude Kieffer, INRS-Energie Materiaux et Telecom, Canada , Chair
  • Tamas Nagy, Max Born Institute, Germany , Chair
  • Gunter Steinmeyer, Max Born Institute, Germany , Chair
  • Constantin Haefner, Lawrence Livermore National Laboratory, United States , Program Chair
  • Bedrich Rus, ELI Beamlines, Czech Republic , Program Chair
  • Giuseppe Sansone, Albert-Ludwigs-Universität Freiburg, Germany , Program Chair
  • Andreas Assion, FemtoLasers Produktions GmbH, Austria
  • Daniele Brida, University of Konstanz, Germany
  • Antonino Di Piazza, Max-Planck-Institut für Kernphysik, Germany
  • Subhendu Kahaly, Extreme Light Infrastructure, ALPS, Hungary
  • Efim Khazanov, Institute of Applied Physics, Russia
  • Andrew Kung, National Tsing Hua University, Taiwan
  • Rodrigo Lopez-Martens, Laboratoire d'Optique Appliquée, France
  • Yann Mairesse, Centre Lasers Intenses et Applications, France
  • Thomas Metzger, TRUMPF Scientific Lasers GmbH + Co. KG, Germany
  • Jean-Luc Miquel, CEA DAM, France
  • Nina Rohringer, Max Planck Advanced Study Group, Germany
  • Luis Roso, Centro de Laseres Pulsados, Spain
  • Hartmut Ruhl, LMU, Germany
  • Emily Sistrunk, Lawrence Livermore National Laboratory
  • Emma Springate, STFC Rutherford Appleton Laboratory, United Kingdom
  • Eiji Takahashi, RIKEN, Japan
  • John Tisch, Imperial College London, United Kingdom
  • Laszlo Veisz, Max-Planck-Institut fur Quantenoptik, Sweden
  • Caterina Vozzi, IFN-CNR, Italy
  • Zhiyi Wei, Institute of Physics, CAS, China


Jean-Claude Kieffer

INRS-Energie Materiaux et Telecom, CANADA

Tamas Nagy

Max Born Institute, GERMANY

Gunter Steinmeyer

Max Born Institute, GERMANY

Constantin Haefner

Lawrence Livermore National Laboratory, UNITED STATES
Program Chair

Bedrich Rus

Program Chair

Giuseppe Sansone

Albert-Ludwigs-Universität Freiburg, GERMANY
Program Chair


OSA - The Optical Society

American Elements, global manufacturer of high purity metals, substrates, laser crystals, advanced materials for semiconductors, optoelectronics, & LEDs.
Class5 Photonics


Active Fiber Systems GmbH 
Amplitude Laser
ARDoP Industrie
KMLabs, Inc.
LOT-QuantumDesign GmbH
UltraFast Innovations

Corporate Contributions

Euclid Techlabs
Luxel Corporation
Rigaku Innovative Technologies