Emerging, compact extreme-ultraviolet and x-ray sources that exhibit high brightness and are small enough to be installed in laboratories at educational and research institutions, manufacturing facilities, hospitals, and other suitable sites, will revolutionize scientific and technical disciplines, complementing both existing and future large scale synchrotron radiation and free-electron laser sources. Applications span a wide range including biomedical, semiconductor manufacturing, fundamental and applied research, environmental engineering, industrial non-destructive testing and screening, and defense and security.

The aim of the Compact EUV and X-ray Light Source meeting is to assemble experts in both source technologies and their applications to present and exchange ideas and improve community wide understanding of current and future source capabilities, and current and future application needs. At this meeting the latest results in the development of these sources will be presented as well as descriptions of efforts to mature the technology so that they meet the requirements needed in order to transition the technology to industrial and medical applications. Conference topics will include relevant applications and source concepts and technologies in the EUV through hard-ray regime.

The collocation with the High-Intensity Sources and High-Field Phenomena (HILAS) meeting provides a unique opportunity to expand interaction with multidisciplinary groups that shares a broad range of interests and goal.

Committee Members

  • Lahsen Assoufid, Argonne National Laboratory, United States , Chair
  • Patrick Naulleau, Lawrence Berkeley National Laboratory, United States , Chair
  • Marie-Emmanuelle Couprie, Synchrotron SOLEIL, France , Program Chair
  • Tetsuya Ishikawa, RIKEN, Japan , Program Chair
  • Jorge Rocca, Colorado State University, United States , Program Chair
  • Akira Endo, HiLase, Czech Republic, Czech Republic
  • Igor Fomenkov, ASML US LP, United States
  • Debbie Gustafson, Energetiq Technology, Inc., United States
  • Hans Hertz, Kungliga Tekniska Hogskolan, Sweden
  • Bob Hettel, Stanford University, United States
  • Franz Kaertner, Universität Hamburg , Germany
  • Annie Klisnick, CNRS, France
  • Kazuhiko Omote, Rigaku Corporation, Japan
  • Zhentang Zhao, Shanghai Institute of Applied Physics, China


Lahsen Assoufid

Argonne National Laboratory, UNITED STATES

Patrick Naulleau

Lawrence Berkeley National Laboratory, UNITED STATES

Marie-Emmanuelle Couprie

Synchrotron SOLEIL, FRANCE
Program Chair

Tetsuya Ishikawa

Program Chair

Jorge Rocca

Colorado State University, UNITED STATES
Program Chair


OSA - The Optical Society

American Elements, global manufacturer of high purity metals, substrates, laser crystals, advanced materials for semiconductors, optoelectronics, & LEDs.
Class5 Photonics


Active Fiber Systems GmbH 
Amplitude Laser
ARDoP Industrie
KMLabs, Inc.
LOT-QuantumDesign GmbH
UltraFast Innovations

Corporate Contributions

Euclid Techlabs
Luxel Corporation
Rigaku Innovative Technologies