A Unique Opportunity to Network and Learn from Leaders in Applied Industrial R&D.
The Laser Applications Conference (LAC) is an all invited speaker format for industry in Laser Applications at the OSA Laser Congress. This 3-day meeting from September 30 to October 2 focuses on two main topic areas -- Materials Processing and Applications for High Power Lasers.
Materials Processing includes advanced applications for industrial use. Applications for High Power Lasers will include topics such as EUV for Lithography, Extreme UV, X-Ray Generation, and Laser Induced Damage Threshold. One of the themes of this meeting will be to initiate discussions on what engineering and production advances are needed to translate promising technological advances into marketable products.
At LAC, you’ll be immersed in an innovative learning environment that introduces new, groundbreaking information, offers insightful knowledge, showcases cutting-edge products, and engages your active participation in important debates and discussions.
A good value!
This is a comprehensive meeting which includes opportunities to hear leading authorities, network with your colleagues and visit with your vendors.
Committee Members
- David Mordaunt,
Ball Aerospace & Technologies, United States
, Program Chair
- Yuji Sano,
Institute for Molecular Science, Japan
, Program Chair
- Johannes Trbola,
Dausinger + Giesen GmbH, Germany
, Program Chair
- Lahsen Assoufid,
Argonne National Laboratory, United States
- Thomas Dekorsy,
German Aerospace Center, Germany
- Heather George,
TRUMPF Inc., United States
- Larry Grimes,
High Energy Laser Joint Tech Office, United States
- Thomas Grunberger,
Plasmo Industrietechnik GmbH, Austria
- Dirk Mueller,
Coherent Inc., United States
- Mohammad Umar Piracha,
AEye, Inc., United States
- Danijela Rostohar,
Institute of Physics of the ASCR, Czech Republic
- Gerald Uyeno,
Raytheon, United States