16 November 2020 – 20 November 2020 OSA Virtual Event - Greenwich Mean Time : Dublin, Edinburgh, Lisbon, London (UTC + 00:00)

Presentation Schedule

  • Louis F. DiMauro, 17 November, 16:00-17:00 UTC, 11:00-12:00 EST
  • Jun Ye, 18 November, 13:30-14:30 UTC, 08:30-09:30 EST
  • Jos Benschop, 19 November, 16:00-17:00 UTC, 11:00-12:00 EST

Louis F. DiMauro

The Ohio State University, USA

Scaling intense laser-atom interactions from low to high frequency

Studies of the wavelength scaling of an intense laser interacting with atoms is driving a renewed interest in the fundamental physics and a renaissance in potential applications in attosecond and imaging science.

Studies of the wavelength scaling of an intense laser interacting with atoms is driving a renewed interest in the fundamental physics and a renaissance in potential applications in attosecond and...

About the Speaker

Louis F. DiMauro is Professor of Physics and Hagenlocker Chair at the Ohio State University. He received his Ph.D. from University of Connecticut in 1980 and postdoc at Stony Brook before arriving at AT&T Bell Laboratories in 1981. He joined the staff at Brookhaven National Laboratory in 1988. In 2004 he joined the faculty at The Ohio State University. He was awarded the 2004 BNL/BSA Science & Technology Prize, the 2012 OSU Distinguished Scholar Award, the 2013 OSA Meggers Prize and the 2017 APS Schawlow Prize in Laser Science. He is a Fellow of the American Physical Society, The Optical Society and the American Association for the Advancement of Science. In 1993, he and his collaborators introduced the widely accepted semi-classical model in strong-field physics. His current work is focused on the generation, measurement and application of attosecond x-ray pulses and the study of fundamental scaling of strong field physics.

Louis F. DiMauro is Professor of Physics and Hagenlocker Chair at the Ohio State University. He received his Ph.D. from University of Connecticut in 1980 and postdoc at Stony Brook before arriving...

Jun Ye

University of Colorado at Boulder JILA, USA

Frequency combs and applications from the extreme ultraviolet to mid infrared

We will present technical approaches and results on producing the brightest sources for frequency combs in both the extreme ultraviolet and mid-infrared, and discuss their applications for novel spectroscopy.

We will present technical approaches and results on producing the brightest sources for frequency combs in both the extreme ultraviolet and mid-infrared, and discuss their applications for novel...

About the Speaker

Jun Ye is a Fellow of JILA and a Fellow of NIST. He is a member of the National Academy of Sciences, a Fellow of the American Physical Society, and a Fellow of The Optical Society. His research focuses on the frontiers of light-matter interactions and includes precision measurement, quantum physics and ultracold matter, optical frequency metrology, and ultrafast science. He has co-authored over 350 scientific papers and has delivered over 550 invited talks. Awards and honors include N.F. Ramsey Prize (APS), Rabi Award (IEEE), US Presidential Rank (Distinguished) Award, four Gold Medals from the U.S. Commerce Department, Foreign Member of the Chinese Academy of Sciences, Frew Fellow of the Australian Academy of Science, I.I. Rabi Prize (APS), European Frequency and Time Forum Award, Carl Zeiss Research Award, William F. Meggers Award and Adolph Lomb Medal from The Optical Society, Arthur S. Flemming Award, Presidential Early Career Award, Friedrich Wilhem Bessel Award of the Alexander von Humboldt Foundation, and Samuel Wesley Stratton Award, and Jacob Rabinow Award from NIST. Group web page, http://jila.colorado.edu/YeLabs/.

Jun Ye is a Fellow of JILA and a Fellow of NIST. He is a member of the National Academy of Sciences, a Fellow of the American Physical Society, and a Fellow of The Optical Society. His research...

Jos Benschop

ASML, Netherlands

EUV lithography has entered high volume manufacturing

Autumn 2019 commercially available smartphones demonstrate that EUV Lithography, using 13.3 nm wavelength, entered high volume manufacturing. In this presentation it will be reflected how a world-wide collaboration over last decades brought us to this point. Future challenges, both for scanner as well as metrology sources, will be shared.

Autumn 2019 commercially available smartphones demonstrate that EUV Lithography, using 13.3 nm wavelength, entered high volume manufacturing. In this presentation it will be reflected how a...

About the Speaker

Jos Benschop received his MSc (cum laude) and Ph.D. from physics faculty in Twente University. From 1984 until 1997 he worked at Philips on optical metrology and optical recording. He joined ASML in 1997. As Senior Vice President Technology he is responsible for research and system engineering within ASML. He has published 30+ papers and generated 20+ patents. He is an SPIE fellow and part-time professor “NNV leerstoel Industriële Natuurkunde” at the University of Twente. He is a member of the Netherlands Academy of Technology and Innovation (https://www.acti-nl.org/nl ). He has been appointed by the king as advisor to the Dutch government on science, technology and innovation (https://www.awti.nl/ ).

Jos Benschop received his MSc (cum laude) and Ph.D. from physics faculty in Twente University. From 1984 until 1997 he worked at Philips on optical metrology and optical recording. He joined ASML...