The aim of the Compact EUV and X-ray Light Source meeting is to assemble experts in both source technologies and their applications to present and exchange ideas and improve community wide understanding of current and future source capabilities, and current and future application needs.
At this meeting the latest results in the development of these sources will be presented as well as descriptions of efforts to mature the technology so that they meet the requirements needed in order to transition the technology to industrial and medical applications. Conference topics will include relevant applications and source concepts and technologies in the EUV through hard-ray regime.
Emerging, compact extreme-ultraviolet and X-ray sources that exhibit high brightness and are small enough to be installed in laboratories at educational and research institutions, manufacturing facilities, hospitals, and other suitable sites, will revolutionize scientific and technical disciplines, complementing both existing and future large scale synchrotron radiation and free-electron laser sources. Applications span a wide range including biomedical, semiconductor manufacturing, fundamental and applied research, environmental engineering, industrial non-destructive testing and screening, and defense and security.
View the complete list of Topic Categories.
- Marie-Emmanuelle Couprie,
Synchrotron SOLEIL, France, Program Chair
- Igor Fomenkov,
ASML US LP, United States
- Federico Furch,
Max Born Institute, Germany
- Luca Giannessi,
Elettra Sincrotrone Trieste, Italy
- Debbie Gustafson,
Energetiq Technology Inc, United States
- Bob Hettel,
Stanford University, United States
- Franz Kaertner,
Universität Hamburg, Germany
- Annie Klisnick,
- François Légaré,
INRS-Energie Mat & Tele Site Varennes, Canada
- Kazuhiko Omote,
Rigaku Corporation, Japan
- Zhentang Zhao,
Shanghai Institute of Applied Physics