23 March 2020 – 25 March 2020 Prague Congress Centre, Prague, Czech Republic


The aim of the Compact EUV and X-ray Light Source meeting is to assemble experts in both source technologies and their applications to present and exchange ideas and improve community wide understanding of current and future source capabilities, and current and future application needs.

At this meeting the latest results in the development of these sources will be presented as well as descriptions of efforts to mature the technology so that they meet the requirements needed in order to transition the technology to industrial and medical applications. Conference topics will include relevant applications and source concepts and technologies in the EUV through hard-ray regime.

Emerging, compact extreme-ultraviolet and x-ray sources that exhibit high brightness and are small enough to be installed in laboratories at educational and research institutions, manufacturing facilities, hospitals, and other suitable sites, will revolutionize scientific and technical disciplines, complementing both existing and future large scale synchrotron radiation and free-electron laser sources. Applications span a wide range including biomedical, semiconductor manufacturing, fundamental and applied research, environmental engineering, industrial non-destructive testing and screening, and defense and security.

View the complete list of Topic Categories.

Committee Members

  • Lahsen Assoufid, Argonne National Laboratory, United StatesChair
  • Patrick Naulleau, Lawrence Berkeley National Laboratory, United StatesChair
  • Tetsuya Ishikawa, RIKEN, JapanProgram Chair
  • Jorge Rocca, Colorado State University, United StatesProgram Chair


Lahsen Assoufid

Argonne National Laboratory, United States

Patrick Naulleau

Lawrence Berkeley National Laboratory, United States

Tetsuya Ishikawa

RIKEN, Japan
Program Chair

Jorge Rocca

Colorado State University, United States
Program Chair


OSA - The Optical Society