Compact (EUV & X-ray) Light Sources

Compact (EUV & X-ray) Light Sources

26 - 28 March 2018
Hilton Strasbourg, Strasbourg, France

Emerging, compact extreme-ultraviolet and x-ray sources that exhibit high brightness and are small enough to be installed in laboratories at educational and research institutions, manufacturing facilities, hospitals, and other suitable sites, will revolutionize scientific and technical disciplines, complementing both existing and future large scale synchrotron radiation and free-electron laser sources. Applications span a wide range including biomedical, semiconductor manufacturing, fundamental and applied research, environmental engineering, industrial non-destructive testing and screening, and defense and security.

The aim of the Compact EUV and X-ray Light Source meeting is to assemble experts in both source technologies and their applications to present and exchange ideas and improve community wide understanding of current and future source capabilities, and current and future application needs. At this meeting the latest results in the development of these sources will be presented as well as descriptions of efforts to mature the technology so that they meet the requirements needed in order to transition the technology to industrial and medical applications. Conference topics will include relevant applications and source concepts and technologies in the EUV through hard-ray regime.

The collocation with the High-Intensity Sources and High-Field Phenomena (HILAS) meeting provides a unique opportunity to expand interaction with multidisciplinary groups that shares a broad range of interests and goal.
 


Topics

  1. EUV through hard-x-ray sources and components
    • Compact storage ring sources
    • Compact Free-electron lasers
    • Inverse Compton scattering sources
    • Laser and discharge produced plasma sources
    • Terahertz-based sources
    • X-ray laser sources
    • High-harmonic generation sources
    • Radio frequency cavities and guns
    • Undulators and wigglers (including permanent magnet, short-period microwave and THz undulators, superconducting devices)
    • Magnets and multiband achromats
    • High power lasers
    • Vacuum chambers and components
    • Others
  2. Applications
    • EUV lithography and mask inspection
    • Semiconductor wafer inspection and metrology
    • Phase contrast imaging and tomography
    • Medical and clinical imaging
    • Biological imaging
    • Macromolecular crystallography
    • Cultural heritage studies
    • Non-destructive testing
    • Ultrafast and dynamic studies
    • Wide field imaging
    • Others
  3. Instrumentation, optics, detectors, data management and processing

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Speakers

  • Christopher Barty, University of California, IrvineUnited States 
    Ultrabright Laser-Compton Light Sources and Novel Applications Keynote
  • Igor Fomenkov, ASML Optics LLCUnited States 
    Laser Produced Plasma EUV Sources for Lithography: Technology, Performance and Prospects Keynote
  • Cameron Geddes, Lawrence Berkeley National LaboratoryUnited States 
    Laser-plasma accelerator driven compact photon sources  Keynote
  • Franz Pfeiffer, Technische Universität MunchenGermany 
    The Munich Compact Light Source (MuCLS): Principles and Application Examples Keynote
  • Thomas André, Synchrotron SOLEILFrance 
    Towards Laser Plasma Acceleration based Free Electron Laser and First Results on COXINEL
  • Loic Bertrand, Synchrotron SOLEILFrance 
    Developments in X-ray and DUV spectral imaging in heritage science
  • Charles Bourassin-Bouchet, Institut d'OptiqueFrance 
    Attosecond Metrology of Partially Coherent Photoelectron Wavepackets
  • Alexander Chao, Tsinghua UniversityUnited States 
    A Compact High-Power Radiation Source Based on Steady-State Microbunching Mechanism
  • Federico Furch, Max Born InstituteGermany 
    Generation of High-Order Harmonics at 100 kHz for Attosecond Science Experiments
  • Luca Giannessi, Sincrotrone Trieste SCpAItaly 
    FERMI: The First Externally Seeded Free Electron Laser in the Extreme Ultraviolet and Soft X-ray Spectral Regions
  • William Graves, Arizona State UniversityUnited States 
    Commissioning of ASU Compact X-ray Light Source (CXLS)
  • Carsten Hartig, Global FoundriesUnited States 
    X-ray metrology for semiconductor manufacturing: Ready for Prime Time?
  • Peter Hommelhoff, Universität Erlangen-NürnbergGermany 
    Laser Acceleration of Electrons on a Chip
  • Hiroshi Kawata, High Energy Accelerator Research OrgJapan 
    Challenges to Realize EUV-FEL High Power Light Source Exceeding 10 kW by ERL Accelerator Technology
  • Ruxin Li, Shanghai Inst of Optics and Fine MechChina 
    High Brightness X-ray Sources Based on Laser Accelerated Electrons
  • Carmen Menoni, Colorado State UniversityUnited States 
    Nanoscale Chemical Imaging by Extreme Ultraviolet Laser Ablation Time of Flight Spectrometry
  • Julia Mikhailova, Princeton UniversityUnited States 
    Plasma-based High-Power X-Ray Pulse Generation and Amplification
  • Emilio Nanni, SLAC National Accelerator LaboratoryUnited States 
    Nano-modulated electron beams via electron diffraction for coherent x-ray generation
  • Eleonore Roussel, Synchrotron SOLEILFrance 
    13 nm FEL Prospects for Lithography
  • Pascal Salieres, Commissariat a l'Energie AtomiqueFrance 
    High Harmonic Generation as an Ultrafast EUV Source for Circular Dichroism and Attosecond Photoionization Spectroscopies
  • Yuji Sano, Japan Science and Technology AgencyJapan 
    Development of Experimental Platform for Laser Wakefield Acceleration of Electrons and Possible Applications
  • Alexander Zholents, Argonne National LaboratoryUnited States 
    A Compact Wakefield Accelerator for a High Repetition Rate Multi User X-ray Free-Electron Laser Facility

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Committee

  • Lahsen Assoufid, Argonne National Laboratory, United States , Chair
  • Patrick Naulleau, Lawrence Berkeley National Laboratory, United States , Chair
  • Marie-Emmanuelle Couprie, Synchrotron SOLEIL, France , Program Chair
  • Tetsuya Ishikawa, RIKEN, Japan , Program Chair
  • Jorge Rocca, Colorado State University, United States , Program Chair
  • Akira Endo, HiLase, Czech Republic, Czech Republic
  • Igor Fomenkov, ASML US LP, United States
  • Debbie Gustafson, Energetiq Technology, Inc., United States
  • Hans Hertz, Kungliga Tekniska Hogskolan, Sweden
  • Bob Hettel, Stanford University, United States
  • Franz Kaertner, Universität Hamburg , Germany
  • Annie Klisnick, CNRS, France
  • Kazuhiko Omote, Rigaku Corporation, Japan
  • Zhentang Zhao, Shanghai Institute of Applied Physics, China

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Plenary Session

Federico Capasso

Harvard University, USA

Quantum Cascade Laser Renaissance

Parametric effects and ultrafast gain dynamics in QCLs lead to single mode instability, multimode operation and to a new regime, the “harmonic” state, which are opening up new frontiers in frequency combs and RF Photonics

About the Speaker

Federico Capasso is the Robert Wallace Professor of Applied Physics at Harvard University, which he joined in 2003 after 27 years at Bell Labs where his career advanced from postdoctoral fellow to Vice President for Physical Research. He is a member of the National Academy of Sciences, the National Academy of Engineering, a fellow of the American Academy of Arts and Sciences (AAAS) and a foreign member of the Accademia dei Lincei. His awards include the IEEE Edison Medal, the American Physical Society Arthur Schawlow Prize in Laser Science, the King Faisal Prize, the SPIE Gold Medal, the AAAS Rumford Prize, the IEEE Sarnoff Award, the Materials Research Society Medal, the Franklin Institute Wetherill Medal, the European Physical Society Quantum Electronics Prize, the Rank Prize in Optoelectronics, the Optical Society Wood Prize, the Berthold Leibinger Future Prize, the Julius Springer Prize in Applied Physics, the Institute of Physics Duddell Medal, the Jan Czochralski Award for lifetime achievements in Materials Science, and the Gold Medal of the President of Italy for meritorious achievement in science.

Britt Turkot

Intel Corp, USA

Compact Sources and Chip-Making

In the past year, EUV LPP exposure sources have reached satisfactory power levels, achieving the long-established milestone of 250W. With EUV exposure tools, the source remains the leading cause of system down-time, including both routine scheduled maintenance as well as unplanned corrective actions. The nature of LPP source design leads to contamination, exposure dose errors, and the need for additional power to mitigate such effects. Compact sources offer possible opportunities in support of chip-making, including not only the option to replace the exposure source but also to provide sources for mask metrology (both lens and lens-less) as well as to support materials research and development.

About the Speaker

Britt joined the Photolithography department at Intel’s Portland Technology and Development organization in 1996 after completing her B.S. degree in Metallurgical Engineering and M.S. and Ph.D. degrees in Materials Science and Engineering from the University of Illinois at Urbana-Champaign. Britt has been involved in many aspects of lithography development in PTD, including her current role as program manager of Intel’s EUV lithography program along with development of scanner reticle and frame graphics as well as the integration of new lithography tool platforms into Intel factories.

Andreas Tünnermann

Fraunhofer Institute for Applied Optics and Precision Engineering, Germany

Perfomance Scaling of Ultrafast Lasers via Coherent Combination

Coherent combination of ultrashort laser pulses emitted from spatially-separated amplifiers is a promising power-scaling technique for ultrafast laser systems concerning peak power and average power. In this presentation, the status and prospects of coherently combined fiber-CPA systems will be discussed.

About the Speaker

Andreas Tünnermann is Director of the Fraunhofer Institute of Applied Optics and Precision Engineering and Chair for the Insitute of Applied Physics at Friedrich-Schiller-University Jena. His main research interests include scientific and technical aspects associated with the tailoring of light. Research topics are the design and manufacturing of novel micro- and nano-optical photonic devices using high-end microlithography and its application for generation, amplification, steering and switching of light. In particular, his work on high power diode pumped fiber and waveguide lasers is widely recognized.

He is a member of the German Physical Society, European Physical Society and acatech, as well as a fellow of OSA and SPIE. His research activities on applied quantum electronics have been awarded with the Röntgen-Award, WLT-Award, Otto-Schott-Award, Leibinger Innovation Award and the Gottfried-Wilhelm-Leibniz-Award. Most recently, he received a European Research Council (ERC) Advanced Grant.

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Quick Links

Topics
Speakers
Committee
Plenary

High-brightness Sources and Light-driven Interactions Congress

High-Intensity Lasers and High-Field Phenomena
Mid-Infrared Coherent Sources
Compact (EUV & X-ray) Light Sources
 

Sponsors

American Elements, global manufacturer of high purity metals, substrates, laser crystals, advanced materials for semiconductors, optoelectronics, & LEDs.
Class5 Photonics
JTEC

Exhibitors

Active Fiber Systems GmbH 
Amplitude Laser
ARDoP Industrie
EKSPLA
FASTLITE
KMLabs, Inc.
LOT-QuantumDesign GmbH
NOVAE
TRUMPF Laser
UltraFast Innovations

Corporate Contributions

ASML
Energetiq 
Euclid Techlabs
Luxel Corporation
Rigaku Innovative Technologies