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Information Optoelectronics, Nanofabrication and Testing (IONT)

01 - 02 November, 2012
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Sarah Benchabane, Femto-st, Besancon, France

Antonella Bogoni, National Inter-Univ. Consortium for Telecommunications, Italy

Hongwei Chen, Tsinghua Univ., China

Xianfeng Chen, Shanghai Jiaotong Univ., Shanghai, China

Yitang Dai, Beijing Univ. of Posts and Telecommunications, China

Harm Dorren, Eindhoven Univ. of Technology, The Netherlands

Guanghua Duan, III-V Lab, France

Weihua Guo, UCSB, USA

Xia Guo, Beijing Univ. of Technology, China

Jianjun He, Zhejiang Univ., China

Li Huo, Tsinghua Univ., China

Erich Kasper, Univ. Sutggart, Germany

John Kouvetakis, Arizona State Univ., USA

Zhaohui Li, Jinan Univ., China

Yong Liu, Univ. of Electronic Science and Technology, China

Chao Lu, The Hongkong Polytechnic Univ., Hong Kong

Chaoyang Lu, Univ. of Science and Technology of China, China

Lars Montelius, Lund Univ., Sweden

Anna Peacock, ORC, Univ. of Southampton, UK

Li Pei, Beijing Jiaotong Univ., China

Richard Penty, Univ. of Cambridge, England

Christophe Peucheret, Technical Univ. of Denmark, Denmark

Wolfgang Sohler, Paderborn Univ., Germany

Yikai Su, Shanghai Jiaotong Univ., China

Jian Wang. Huazhong University of Science and Technology, China

Lech Wosinski, Royal Inst. of Technology (KTH), Sweden

Lianshan Yan, Xinan Jiaotong Univ. ,Chengdu, China

Sigang Yang, Tsinghua Univ., China

Lilin Yi, Shanghai Jiaotong Univ., China

Jinzhong Yu, Inst. of Semiconductors, CAS, China

Wanhua Zheng, Inst. of Semiconductors, CAS, China

Linjie Zhou, Shanghai Jiaotong Univ., China

Chunle Xiong, Univ. of Sydney, Australia

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