Skip to main content

Short Wavelength Sources and Attosecond/High Field Physics (OH)

Short Wavelength Sources and Attosecond/High Field Physics

This group provides a focus for activities related to the development and application of high intensity lasers as well as novel XUV and x-ray sources. Specific interests include the technology of high intensity, ultrafast lasers, the physics of high intensity light interactions with matter, and the generation of high brightness short wavelength radiation with ultrafast lasers. Part of the group is also interested in advances in traditional short wavelength sources including insertion devices for storage rings (undulators and wigglers), plasma X-ray lasers, electron beam based sources and X-ray free electron lasers. At the leading front of the attosecond science the group will also embrace attosecond pulse generation and its surface- and volume-interaction with solid state, liquid and gaseous materials, including biological and organic materials and nanomaterial structures. The group intends to serve fundamental researchers as well as the technological and industrial community.

High-Harmonic Sources for Material Development and Metrology in the Semiconductor Industry

When: 24 March 2021, 10:00 - 11:00 Eastern Time

Register Now

The webinar hosted by the OSA Short Wavelength Sources and Attosecond/High Field Physics Technical Group will showcase a very recent important technological application of attosecond science in the semiconductor industry by featuring a shared presentation between Prof. Henry Kapteyn and Dr. John Petersen.

Partnering with KM Labs and SPECS, imec launched the AttoLab in February 2019 to provide interference lithographic imaging below the 22nm pitch while also providing ultrafast ability to track the radiolysis of resists exposed to EUV using coherent sources produced with high harmonic generation. This part of the AttoLab supports the development of high NA EUV lithography. Beyond resists, with the ability to look at the physics and chemistry of materials from the first 200 attoseconds out to 200 picoseconds after an excitation event, imec will study the solid-state dynamics of 2D and topological materials needed for the sub-3 nm technology node. In this effort, we develop and use characterization spectral and imaging methods that may one day become temporal-spatial metrology. This capability helps imec to bridge the scientific and technical gap between today and the quantum age in the areas of materials, imaging metrology, and lithography.

Subject Matter Level:

  • Intermediate - Assumes basic knowledge of the topic

What You Will Learn:

  • Ultrafast lasers and pump-probe spectroscopies use in the AttoLab for photoresist characterization: a holistic approach.
  • Material characterization and imaging techniques that use HHG with examination for their potential use with next generation metrologies needed for producing sub-2 nm technology node integrated circuits.
  • Challenges of high numerical aperture EUV lithography and ways to probe and mitigate using ultrafast pump-probe spectroscopies and ab initio molecular dynamics studies.

Who Should Attend:

  • Photochemists
  • Ultrafast kineticists
  • HHG researchers
  • Electron, IR spectroscopists
  • Lithographers

About the Presenters:

Henry Kapteyn, JILA, University of Colorado at Boulder and NIST

Dr. Henry C. Kapteyn is a Professor at the Department of Physics and a Fellow of JILA, at the University of Colorado. He is most known for the development of x-ray and short-wavelength lasers as well as for a new generation of lasers which make it straightforward to produce light pulse of less than ten femtoseconds duration. Prof. Kapteyn received numerous awards, including OSA Adolf Lomb’s medal (1993) and APS Ahmed Zewail Award in Ultrafast Science and Technology (2009). He is a fellow of OSA, APS, AAAS and the American Academy for Arts and Sciences.

John Petersen, IMEC

John Petersen and Paul van der Heide are co-leaders of the AttoLab, a new ultrafast chemistry and physics laboratory at imec, Belgium; and, John is an adjunct professor of physical chemistry at the University of Maryland. At imec, he studies the ultrafast ionization and radiolysis processes of EUV resists and is exploring the use of HHG for future metrologies for the quantum age. John is a SPIE Fellow and a former Fellow at SEMATECH. For forty years, John has explored the interaction of the physics of lithographic systems with the chemistry of the imaging materials and their interfaces.

Giulio Vampa Stanford PULSE InstituteChair
Balazs Major ELI-ALPS, University of SzegedChair-Elect
Eric Cunningham SLAC National Accelerator LaboratoryMember
Hanieh Fattahi Max-Planck-Inst Physik des LichtsMember
Benjamin Webb University of RochesterMember
Zhiyi Wei CAS Institute of PhysicsMember

If you are a member of the Short Wavelength Sources and Attosecond/High Field Physics Technical Group and have ideas for activities and initiatives to help engage this community, please share them with the chair, Giulio Vampa.


View OSA Technical Group webinars on-demand at any time or register for any of our upcoming webinars online. Each webinar is an hour long and features a technical presentation on a topic selected by your OSA Technical Groups.

Find us on Twitter at #OSAOH


On-Demand Webinars

You can watch any of the following webinar presentations, which were hosted by the OSA Short Wavelength Sources and Attosecond/High Field Physics Technical Group, on-demand.

As a niche online job board, more efficiently connects employers, job seekers and consultants within the optics and photonics community compared to broader job boards.
Search Jobs »