31 October 2019

The Optical Society Announces 2020 Fellows Class

WASHINGTON – The Optical Society (OSA) Board of Directors has elected 94 members to the society’s 2020 Fellows Class. Fellows are selected based on several factors, including contributions to education, research, engineering, business and the community.

“Being named an OSA Fellow is a singular honor and indicates a history of achievement in optics and photonics, and a reputation for service to OSA and our field,” said OSA President Ursula Gibson. “Congratulations to the 2020 Fellows Class, and our thanks to the OSA Fellow Members Committee, nominators and references for their continued support of this program.”

OSA Fellows are members who have served with distinction in the advancement of optics and photonics. The OSA Fellow Members Committee, led by Aref Chowdhury, Nokia Corporation, U.S.A., reviewed more than 200 nominations submitted by current OSA Fellows and recommended candidates for election to the Awards Council and OSA Board of Directors. No more than 10 percent of the total OSA membership may be Fellows at any given time, making each year’s honorees a highly selective group.

The new Fellows will be honored at OSA conferences and meetings throughout 2020.

2020 OSA Fellows Class Members:

Cristian Antonelli
Università degli Studi dell'Aquila, Italy

Mete Atature
University of Cambridge, U.K.

Abul Azad
Los Alamos National Laboratory, U.S.A.

Julie Bentley
University of Rochester, U.S.A.

Ivan Biaggio
Lehigh University, U.S.A.

Fabien Bretenaker
CNRS and Université Paris-Saclay, France

David C. Brown
Advanced Photonic Sciences, U.S.A.

Yangjian Cai
Soochow University & Shandong Normal University, China

Yi Cai
ZTE TX, Inc., U.S.A.

Francesca Calegari
Deutsches Elektronen Synchrotron (DESY) and Universität Hamburg (UHH), Germany

Christophe Caloz
KU Leuven, Belgium and Polytechnique Montréal, Canada

Liangcai Cao
Tsinghua University, China

Peter B. Catrysse
Stanford University, U.S.A.

Yanne Chembo
University of Maryland, U.S.A.

Yung-Fu Chen
National Chiao Tung University, Taiwan

Nan Chi
Fudan University, China

Wonshik Choi
Korea University and Center for Molecular Spectroscopy and Dynamics, Institute for Basic Science, South Korea

Jianming Dai
Tianjin University, China

Thomas Dekorsy
German Aerospace Center, Germany

Hilmi Volkan Demir
Nanyang Technological University, Singapore and Bilkent University UNAM, Turkey

Mark R. Dennis
University of Birmingham, U.K.

Nibir K. Dhar
C5ISR Center NVESD, U.S.A.

Achyut K. Dutta
Banpil Photonics, Inc., U.S.A.

Nikolaos Efremidis
University of Crete, Greece

Stefan Enoch
Aix-Marseille Université, CNRS, Centrale Marseille, Fresnel Institut, France

Alexandre Y. Fong
TruTag Technologies Inc, U.S.A.

Andrea Fratalocchi
King Abdullah University of Science and Technology, Saudi Arabia

Ling Fu
Huazhong University of Science and Technology, China

Ulrike Fuchs
Asphericon GmbH, Germany

Michael Gehm
Duke University, U.S.A.

Zabih Ghassemlooy
University of Northumbria at Newcastle, U.K.

Lynford L. Goddard
University of Illinois at Urbana-Champaign, U.S.A.

Vivek K Goyal
Boston University, U.S.A.

Bai-Ou Guan
Jinan University, China

Julio C. Gutiérrez-Vega
Tecnologico de Monterrey, Mexico

Jianhua Hao
Hong Kong Polytechnic University, Hong Kong

Yoshio Hayasaki
Utsunomiya University, Japan

Sven Hoefling
University of Wuerzburg, Germany and University of St Andrews, U.K.

Jennifer J. Hunter
University of Rochester, U.S.A.

Xavier Intes
Rensselaer Polytechnic Institute, U.S.A.

Andrey Alekseevich Ionin
P.N. Lebedev Physical Institute of Russian Academy of Sciences, Russia

Jian-Ming Jin
University of Illinois at Urbana-Champaign, U.S.A.

Igor Jovanovic
University of Michigan, U.S.A.

Safa Kasap
University of Saskatchewan, Canada

Fumio Koyama
Tokyo Institute of Technology, Japan

Shiva Kumar
McMaster University, Canada

John H. Lehman
National Inst of Standards & Technology, U.S.A.

Giuseppe Leo
Université de Paris, France

Xiuling Li
University of Illinois, U.S.A.

Di Liang
Hewlett Packard Labs, Hewlett Packard Enterprise, U.S.A.

Rongguang Liang
University of Arizona, U.S.A.

Chien-Chung Lin
National Chiao Tung University, Taiwan

Lih Y. Lin
University of Washington, U.S.A.

Na Liu
Kirchhoff-Institute for Physics, University of Heidelberg, Germany

Chris Mack
Fractilia, U.S.A.

Claudio Mazzali
Corning Optical Communications, U.S.A.

Vinod Menon
City College of New York & Graduate Center, City University of New York, U.S.A.

Alan Migdall
Joint Quantum Institute, National Institute of Standards & Technology and University of Maryland, U.S.A.

Jeremy N. Munday
University of California, Davis, U.S.A.

Dragomir Neshev
Australian National University, Australia

Alexander Nosich
Institute of Radiophysics and Electronics, National Academy of Sciences of Ukraine, Ukraine

Irina Novikova
William & Mary, U.S.A.

Salah Obayya
Zewail City of Science and Technology, Egypt

Shilong Pan
Nanjing University of Aeronautics and Astronautics, China

Glen Perram
Air Force Institute of Technology, U.S.A.

Thomas Pfeiffer
Nokia Bell Labs, Germany

Todd Pittman
University of Maryland Baltimore County, U.S.A.

Jianrong Qiu
Zhejiang University, China

Elizabeth Rogan
The Optical Society (OSA)

Katharine Schmidtke
Facebook Inc., U.S.A.

Sze Set
University of Tokyo, Japan

Heng Tao Shen
University of Electronic Science and Technology of China, China

Jesse E. Simsarian
Nokia Bell Labs, U.S.A.

Ranjan Singh
Nanyang Technological University, Singapore

Melissa Skala
University of Wisconsin-Madison and Morgridge Institute for Research, USA

Anders Søndberg Sørensen
The Niels Bohr Institute, University of Copenhagen, Denmark

Larry B. Stotts
Stotts Consulting, U.S.A.

Greg Sun
University of Massachusetts Boston, U.S.A.

Taco Visser
Vrije Universiteit Amsterdam, Netherlands

Laurent Vivien
Centre for Nanoscience and Nanotechnology (C2N), CNRS, Université Paris-Sud, Université Paris Saclay, Palaiseau, France

Philip Walther
University of Vienna, Austria

Qijie Wang
Nanyang Technological University, Singapore

Stacie Williams

Rachel Won
Nature Photonics, U.K.

Elaine Wong
Melbourne School of Engineering, University of Melbourne, Australia

Jianke Yang
University of Vermont, U.S.A.

Joel Yang
Singapore University of Technology & Design, Singapore

Ken-Tye Yong
Nanyang Technological University, Singapore

Siyuan Yu
University of Bristol, U.K.

Zongfu Yu
University of Wisconsin-Madison, U.S.A.

C. Patrick Yue
Hong Kong University of Science and Technology, Hong Kong

Han Zhang
Shenzhen University, China

Lin Zhang
Aston University, U.K.

Jianqiang Zhu
Shanghai Institute of Optics and Fine Mechanics, China


About The Optical Society

The Optical Society (OSA) is dedicated to promoting the generation, application, archiving, and dissemination of knowledge in optics and photonics worldwide. Founded in 1916, it is the leading organization for scientists, engineers, business professionals, students, and others interested in the science of light. OSA’s renowned publications, meetings, online resources, and in-person activities fuel discoveries, shape real-life applications and accelerate scientific, technical, and educational achievement.

About Optica

Optica (formerly OSA) is dedicated to promoting the generation, application, archiving and dissemination of knowledge in optics and photonics worldwide. Founded in 1916, it is the leading organization for scientists, engineers, business professionals, students and others interested in the science of light. Optica’s renowned publications, meetings, online resources and in-person activities fuel discoveries, shape real-life applications and accelerate scientific, technical and educational achievement.

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