Optical Interference Coatings (OIC)

Topical Meeting and Tabletop Exhibit

Technical Conference: June 6-11, 2010
Loews Ventana Canyon Resort and Spa
Tucson, Arizona

View the meeting archives for 2007 OIC Highlights.

2010 Meeting Chairs

Christopher J. Stolz, Lawrence Livermore Natl. Lab, USA, General Chair
Markus K. Tilsch, JDS Uniphase Co., USA, Program Chair

Cooperating Societies

SPIE

The European Optical Society

About Optical Interference Coatings (OIC)

This meeting serves as a focal point for global technical interchange in the field of optical interference coatings. It will include papers on research, development and applications of optical coatings, such as fundamental and theoretical contributions in the field as well as practical techniques and applications.

This conference, like its predecessors, meets every three years to survey and capture advancements in the broad area of optical coatings. The format of the meeting includes invited papers by leaders in the field, short oral presentations of papers and poster sessions with ample discussion periods. There are no parallel sessions.

Topics to Be Covered

Deposition Process Technologies

• Process control, monitoring, and automation
• Low and high energy deposition techniques
• Industrial sputtered metal and dielectric coatings
• Pulsed deposition processes
• Novel deposition methods
• Substrate cleaning and coating post-treatment techniques

Applications

• Coatings for solar energy utilization and environmental control
• Coatings for nanostructures and photonic crystals
• Coatings for Micro-Opto-Electro-Mechanical-Systems (MOEMS)
• Coatings for displays and lighting applications
• Coatings for biological applications
• Coatings for ultrafast applications
• Coatings for astronomical and space applications
• Coatings for short wavelengths EUV, XUV, UV
• Coatings for visible wavelengths
• Coatings for near and far IR spectral regions
• Coatings for polarization management
• Coatings on plastic
• Coatings for security and decorative applications
• Coatings for telecommunication components

Coating and Substrate Materials

• Novel coating materials (nonlinear, organic, electrochromic, electroluminescent, metamaterial, etc.)
• Transparent conductive coatings
• Composite material coatings
• Unusual substrate materials

Characterization and Properties of Coatings

• Fundamentals of thin film growth
• Optical and diffractive properties
• Scattering, absorption, and birefringence
• Micro and nanostructure properties
• Mechanical properties
• Stress, adhesion, and cohesion
• Thermal properties
• Environmental stability
• Laser induced damage
• Optical and non-optical thin film characterization techniques

Design of Coatings

• Computer and analytical design techniques
• Computational manufacturing
• Design of coatings for polarization control
• Multilayers on gratings
• Structured and waveguide coatings

Technical Program Committee

Christopher J. Stolz, Lawrence Livermore Natl. Lab, USA, General Chair
Markus K. Tilsch, JDS Uniphase Co., USA, Program Chair
Stephen D. Browning, Ball Aerospace and Technologies Corp., USA
Mireille Commandré, Inst. Fresnel, France
Svetlana Dligatch, Commonwealth Scientific and Industrial Res. Organization, Australia
Angela Duparré, IOF Fraunhofer Inst., Germany
Francois R. Flory, Ecole Centrale Marseille, France
Michael L. Fulton, Ion Beam Optics, USA
Martina Gerken, Univ. of Karlsruhe, Germany
Karen Hendrix, JDSU, USA
Flavio Horowitz, Inst.de Física, Univ. Federal do Rio Grande do Sul, Brazil
Chang Kwon Hwangbo, Inha Univ., Republic of Korea
Michael Ray Jacobson, Optical Data Associates, USA
Cheng‐Chung Lee, Natl. Central Univ., Taiwan
Li Li, Natl. Res. Council, Canada
Xu Liu, Zhejiang Univ., China
Roland Loercher, Carl Zeiss SMT AG, Germany
Roberto Machorro, IFUNAM, Mexico
Ludvik Martinu, Ecole Polytechnique Montreal, Canada
Ekishu Nague, SHINCRON Co.,Ltd., Japan
James Oliver, Univ. of Rochester, USA
Bruce Perilloux, Coherent Inc., USA
Angela M. Piegari, ENEA, Italy
James Rancourt, Consultant, USA
Carl G. Ribbing, Uppsala Univ., Sweden
Detlav Ristau, Laser Zentrum Hannover eV, Germany
Robert W. Schaffer, Evaporated Coatings, Inc., USA
Jiando Shao, Shanghai Inst of Optics and Fine Mech., China
Noriaki Toyoda, Univ. of Hyogo, Japan
Michael K. Trubetskov, M. V. Lomonosov Moscow State Univ., Russia
Zhanshan Wang, Tongji Univ., China
Alfons Zoeller, Leybold Optics, Germany

Advisory Committee

J.A. Dobrowolski, Natl. Res. Council, Canada
Norbert Kaiser, IOF Fraunhofer Inst., Germany
H. Angus MacLeod, Thin Film Ctr., USA
Alfred J. Thelen, JCM, Frankfurt, Germany
Alexander V. Tikhonravov, Moscow State Univ., Russian Federation
Ric P. Shimshock, MLD Technologies, USA
Douglas J. Smith, Univ. of Rochester, USA
Christopher J. Stolz, Lawrence Livermore Natl. Lab, USA
Brian T. Sullivan, Iridian Spectral Technologies, Canada