Advanced Solid State Lasers

16 - 21 11月 2014
Hilton Shanghai Hongqiao, Shanghai, China

Committee List

General Chairs

Guenter Huber, Universität Hamburg, Germany
Ruxin Li, Shanghai Inst of Optics and Fine Mech, China
Peter Moulton, Q-Peak, Inc., USA


Program Chairs

Materials
Shibin Jiang, AdValue Photonics, Inc., USA
Richard Moncorge, Universite de Caen, France

Sources
Gregory D. Goodno, Northrop Grumman Aerospace Systems, USA
Alphan Sennaroglu, Koc University, Turkey
Heping Zeng, East China Normal University, China

Applications
Michael M. Mielke, Raydiance Inc, USA
Francois Salin, EOLITE Systems, France
Xiao Zhu, Huazhong University, China


Program Committee

Materials

Gerard Aka, Ecole Natl Superieure de Chimie de Paris, France
Maxim E. Doroshenko, A.M. Prokhorov General Physics Inst RAS, Russia
Helena Jelinkova, Czech Technical University, Czech Republic
Ajoy Kumar Kar, Heriot-Watt University, UK
Christian Kraenkel, Universität Hamburg, Germany
Jacob Isa Mackenzie, University of Southampton, UK
Sergey B. Mirov, University of Alabama at Birmingham, USA
Yasutake Ohishi, Toyota Technological Institute, Japan
Jianrong Qiu, South China University of Technology, China
Jasbinder S. Sanghera, US Naval Research Laboratory, USA
Jianda Shao, Shanghai Inst of Optics and Fine Mech, China
Stefano Taccheo, Swansea University - College of Engineering - Multidisciplinary Nanotechnology Centre, UK
Takunori Taira, Institute for Molecular Science, Japan
Mauro Tonelli, Università degli Studi di Pisa, Italy
Limin Tong, Zhejiang University, China
Brian M. Walsh, NASA Langley Research Center, USA
Jun Xu, CAS Shanghai Institute of Ceramics, China
Carlos Zaldo, Inst Ciencia Materiales de Madrid. CSIC, Spain

Sources
Weibiao Chen, Shanghai Inst of Optics and Fine Mech, China
Majid Ebrahim-Zadeh, ICFO -The Institute of Photonic Sciences, Spain
Katia Gallo, Royal Institute of Technology - KTH, Sweden
F. Oemer Omer Ilday, Bilkent Universitesi, Turkey
Stuart Dale Jackson, Macquarie University, Australia
Yoonchan Jeong, Seoul National University, South Korea
R. Jason Jones, University of Arizona, USA
Junji Kawanaka, Osaka University, Japan
Sunao Kurimura, National Institute for Materials Science, Japan
Helen Margaret Pask, Macquarie University, Australia
Valentin Petrov, Max Born Institute, Germany
Bryce N. Samson, Nufern, USA
Akira Shirakawa, University of Electro-Communications, Japan
Thomas Sudmeyer, Universite de Neuchatel, Switzerland

Applications
Brian Walter Baird, Summit Photonics, USA
Adela Ben-Yakar, Univeristy of Texas Austin, USA
Jiyeon Choi, Korea Institute of Machinery & Materials, South Korea
Ulrich Hefter, Rofin-Sinar, Inc., Germany
Clemens Hoenninger, Amplitude Systems, France
Haibin Zhang, Electro Scientific Industries, Inc.
Yuxing Zhao, Delphi Lasers, China

Industry Program Committee

Shibin Jiang, AdValue Photonics, Inc., USA, chair
Beth Cohen, IPG Photonics Corp., USA
Quentin Mocaer, Amplitude Systemes, Taiwan
Joachim Sacher, Sacher Lasertechnik, Germany
Johannes Trbola, Trbola Engineering, Germany