Events
The 59th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
Endorsed by Optica
Hosted By: Technical Group
26 - 29 May 2015
Micro- and Nanolithography Electron and Ion beam lithography Optical and Extreme UV (EUV) lithography Nano-imprint lithography Maskless and high throughput direct write lithography 3D micro and nanolithography Resists and lithographic support materials Mask, template and stencil fabrication Directed self-assembly Tip-based and scanning probe lithography Electron and Ion beam sources and optics Large area nanoscale patterning Simulation and modeling of patterning technologies Lithography for packaging and 3D integration Process and Metrology Technologies Electron, ion and photon beam stimulated etching and deposition Ion beam microscopy including Ga, He, Li and novel sources Multibeam and high throughput imaging instruments Nanoparticle and nanotube assembly and placement Advanced pattern transfer concepts Aberration corrected electron beam instruments Process simulation and modeling Nanomanipulation and precision placement Advanced scanning probe and tip-based imaging Processing for novel 2D materials (MoS2, graphene) Applications and Emerging Topics Nanoelectronics and Bio-nanoelectronics Nanostructured Interfaces to Biology Patterned media High density solid state storage & nonvolatile memory devices Nanophotonics and plasmonics Nanobiology and nanomedicine Micro- and nano-fluidics Carbon-based nanodevices (CNTs & graphene) Nanofabrication for energy sources Micro- and nano-scale mechanical devices and MEMs DNA origami and biologically inspired assembly
