International Workshop on Compact EUV & X-ray Light Sources
30-31 October 2014
Omni Shoreham Hotel
Uwe Arp, National Institute of Standards and Technology
Patrick Naulleau, Lawrence Berkely National Laboratory
Lahsen Assoufid, Argonne National Laboratory
Sandra Biedron, Colorado State University
Mark Curtin, Boeing
Debbie Gustafson, Energetiq
Jorge Rocca, Colorado State University
Obert Wood, Global Foundries
Stefan Wurm, SEMATECH
Wenbing Yun, Sigray, Inc.
Emerging compact extreme-ultraviolet and x-ray sources small enough to be installed in laboratories, manufacturing facilities, and hospitals will revolutionize scientific disciplines complementing large scale synchrotron radiation sources. Applications span a wide range including biomedical, semiconductor manufacturing, fundamental and applied research, environmental engineering, defense and security, and industrial non-destructive testing.
At the recent OSA Compact EUV and X-Ray Light Sources Incubator Meeting
, which was held in November 2013, both light source developers and end-users, including individuals from academia, government laboratories and institutions, and industry gathered to discuss and address the scientific grand challenges and the technical challenges of sources and peripherals. The result was an understanding of the applications, requirements, and current development status of compact sources was developed.
This follow-up two-day workshop on compact sources is to build upon the momentum and the enthusiasm created by the past OSA incubator meeting to gather both the compact light source developers, potential users, and others interested in this new field to present their work, exchange ideas, and to network with colleagues from with diverse needs and interests. The end goal is to push the technological limits, define future research directions, and build a new community of users.
In particular, the colocation with the SEMATECH 2014 International Symposium on Extreme Ultraviolet Lithograph
y provides a unique opportunity for the EUV and X-ray light source developers to interact with the EUV lithography users, learn about their fundamental and practical needs, and assess the current status of EUV/Soft X-ray sources. The two programs will coordinate to encourage interaction / discussion between the source compact x-ray source developers and the end users. The workshop will identify the most promising source technologies for meeting future needs in areas such as lithography, actinic and non-actinic mask metrology, and wafer inspection.
Contributions to the workshop are sought in source concepts, technologies and subsystems as well in current and future potential applications. The workshop will include a few of plenary talks to motivate the discussion, yet the primary focus of the workshop will be on breakout sessions. Examples of possible breakout session topics include:
High average power EUV light sources
Ultrafast light sources and time resolved metrologies
Light sources for biological and medical applications
Hard x-ray light sources for materials characterization