International Optical Design Conference (IODC)

International Optical Design Conference (IODC)

22 - 26 June 2014
The Fairmont Orchid, Kohala Coast, Hawaii, USA
The International Optical Design Conference will be held in 2018. More information about this meeting will be posted in 2017.

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Optical design remains a rapidly developing field due to the increased performance demands, improved software and computing platforms for modeling, better algorithms, and new fabrication technologies for better performance. The International Optical Design Conference (IODC), which occurs every four years, provides the most important meeting in optical design for engineers, scientists and designers to stay abreast of the changes in this field. Attendees from around the world in a breadth of optical design disciplines will be able to interact in both informal and formal settings.

Topics of special interest for IODC are illumination system fabrication, surface representation in lens design, desensitizing designs and reduction in cost, beam shaping, micro-optics, polarization, and computational imaging.


Kevin Rolland-Thompson, Synopsys, Inc, United States, Computational Imaging Challenges, Plenary

Rob Bates, FiveFocal LLC, United States, Digital Imaging System Design and Trade Space Analysis, Invited

Thomas Brown, U of Rochester, The Institute of Optics, United States, Imaging the Polarization of a Light Field , Invited

Peter Clark, LensVector Inc, United States, Mobile Platform Optical Design, Invited

Alexander Epple, Carl Zeiss AG, Germany, Free Form Surfaces in Imaging Optics, Invited

Joseph Ford, University of California, San Diego, United States, Telescope Contact Lenses and the Fiber-coupled Scale Model Eye , Invited

Andrew Harvey, University of Glasgow, United Kingdom, Title to be Determined, Invited

James Harvey, Photon Engineering LLC, Integration of Optical Fabrication and Metrology into the Optical Design Process, Invited

Juan Carlos Miñano, Universidad Politécnica de Madrid, Anastigmatic Imaging with Unconstrained Object to Image Mapping, Invited

Thomas Nobis, Carl Zeiss AG, Germany, A Lens-resolved Approach for Analyzing and Correcting Secondary Axial Color, Invited

Richard Pfisterer, Photon Engineering LLC, United States, Color Correction Strategies in Optical Design, Invited

Jannick Rolland, University of Rochester, United States, The Pamplemousse: The Optical Design, Fabrication, and Assembly of a 3-mirror Freeform Imaging Telescope, Invited

Derek Sabatke, Ball Aerospace & Technologies, United States, Ray-tracing for Coordinate Knowledge in the JWST Integrated Science Instrument Module, Invited

Jose Sasian, University of Arizona, United States, Field Curvature Aberration: What is New?", Invited

Daniel Smith, Nikon Research Corporation of America, United States, Illumination in Microlithography - A Brief History, Invited

Michael Theisen, University of Rochester, United States, Phase Effects in Guided Mode Resonance Filters, Invited

Anthony Visconti, Melles Griot Inc, United States, Stress-Induced Index Gradients in Optical Design, Invited

Chunyu Zhao, University of Arizona, United States, Design of Progressive Addition Lens with Newly Developed Curvature Polynomials, Invited

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OSA - The Optical Society