Emerging, compact extreme-ultraviolet and x-ray sources that exhibit high brightness and are small enough to be installed in laboratories at educational and research institutions, manufacturing facilities, hospitals, and other suitable sites, will revolutionize scientific and technical disciplines, complementing both existing and future large scale synchrotron radiation and free-electron laser sources. Applications span a wide range including biomedical, semiconductor manufacturing, fundamental and applied research, environmental engineering, industrial non-destructive testing and screening, and defense and security.
The aim of the Compact EUV and X-ray Light Source meeting is to assemble experts in both source technologies and their applications to present and exchange ideas and improve community wide understanding of current and future source capabilities, and current and future application needs. At this meeting the latest results in the development of these sources will be presented as well as descriptions of efforts to mature the technology so that they meet the requirements needed in order to transition the technology to industrial and medical applications. Conference topics will include relevant applications and source concepts and technologies in the EUV through hard-ray regime.
The collocation with the High-Intensity Sources and High-Field Phenomena (HILAS) meeting provides a unique opportunity to expand interaction with multidisciplinary groups that shares a broad range of interests and goal.
Lahsen Assoufid, Argonne National Laboratory, United States
Patrick Naulleau, Lawrence Berkeley National Laboratory, United States
Marie-Emmanuelle Couprie, Synchrotron SOLEIL, France
Tetsuya Ishikawa, RIKEN, Japan
Jorge Rocca, Colorado State University, United States
Akira Endo, HiLase, Czech Republic, Czech Republic
Igor Fomenkov, ASML. San Diego, United States
Debbie Gustafson, Energetiq Technology, Inc., United States
Hans Hertz, Kungliga Tekniska Hogskolan, Sweden
Bob Hettel, Stanford University, United States
Franz Kaertner, Center for Free-Electron Laser Science, Germany
Annie Klisnick, CNRS, France
Kazuhiko Omote, Rigaku Corporation, Japan
Zhentang Zhao, Shanghai Institute of Applied Physics, China