Advanced Solid State Lasers Conference and Exhibition (ASSL)

Advanced Solid State Lasers Conference and Exhibition (ASSL)

ASSL highlights new sources, advanced technologies, components and system design to improve the operation and application of solid state lasers.  It covers the spectrum of solid state lasers from materials research to applied science and design innovations.  Hear research on innovation in materials, components, fabrication techniques and design alternatives to enhance laser performance.

This is the only international event presenting materials, sources, and applications all in one meeting in a single track format.


Applications

Applications cover ways in which the advances in materials and sources highlighted by ASSL have an important impact on science and industry. Specific topics emphasized may vary from one meeting to the next, but, beyond science, may include materials processing including cutting and marking, advanced lithography, energy, metrology, welding, astronomy, security and medicine.

  • Laser and systems for medical applications

  • Laser and systems for consumer electronics manufacturing

  • Additional application topics will be considered for presentation

Materials

Materials are the basis for the technology covered by ASSL, and the meeting encompasses advances in optics, materials science, condensed matter physics and chemistry relevant to the development, characterization and applications of new materials for lasers and photonics. These include bulk crystals, glasses and ceramics, as well as micro-structured materials such as optical fibers, planar waveguides and periodically patterned non-linear crystals.

  • Laser crystals and glasses

  • Transparent ceramics

  • Crystal and glass fibers

  • Nonlinear crystals and processes

  • Waveguides and laser patterning

  • Photonic structures

  • Semiconductors for lasers, LED and detectors

  • Materials for lighting and laser display

  • Advances in crystal growth techniques

  • Modeling and characterization methods of laser and nonlinear properties

Sources

Coherent and high brightness radiation sources include lasers as well as pump and nonlinear devices. In this component, the emphasis is on advances in the source science and technology, aimed at some combination of improved power, efficiency and brightness, increased wavelength coverage, narrower and more stable frequencies and, for pulsed sources, shorter pulse widths.

  • Solid state lasers

  • Fiber lasers

  • Optical sources based on nonlinear frequency conversion schemes

  • High power CW and pulsed sources

  • IR, visible and UV Sources

  • Laser beam combining and emerging power scaling architectures

  • Short-pulse lasers

  • Frequency combs and frequency-stable lasers

  • Microchip and compact lasers

  • Tunable and new wavelength lasers

  • Optically pumped semiconductor lasers

Andrius Baltuska, Technische Universität Wien, Austria, Multi-millijoule Few-Optical-Cycle Pulses in Mid-IR: Scaling Power, Energy and Wavelength, Invited

Fetah Benabid, Xlim Research Insititute, France, Ultra-Fast Laser Beam Delivery and Pulse Compression with Kagome Hollow-core Pcf, Invited

Jens Biegert, ICFO -The Institute of Photonic Sciences, Spain, High Energy Mid-IR OPCPA at 7 μm with 2 μm Pump, Invited

Sung-Hak Cho, KIMM, Korea University of Science & Technology, Korea, Present Status and Trend of Femtosecond Laser Processing in Next Generation Display AMOLED Manufacturing Industry of Korea, Invited

W. Andrew Clarkson, University of Southampton, United Kingdom, Cladding-pumped Radially-polarized Fiber Lasers, Invited

Iyad Dajani, US Air Force Research Laboratory, United States, Mitigation Strategies for Optical Nonlinearities in Kilowatt-class Narrow-linewidth Fiber Amplifiers, Invited

Marcos Dantus, Michigan State University, United States, Femtosecond Lasers as Universal Sources for Chemical Sensing and Biomedical Applications, Invited

Todd Ditmire, National Energetics, Inc, University of Texas, United States, High Repetition Rate kJ-class Nanosecond to Femtosecond Lasers, Invited

Liang Dong, Clemson University, United States, Challenges for Further Power Scaling of Single-Mode Fiber Lasers, Invited

Mark Dubinskii, US Army Research Laboratory, United States, Power Scaling Potential of Er-doped Fiber Lasers Based on Advanced Fiber Materials, Invited

Andreas Fix, Institut für Physik der Atmosphäre, Germany, Development and First Results of A New Near-ir Airborne Greenhouse Gas Lidar, Invited

Katia Gallo, KTH - Royal Institute of Technology, Sweden, Recent Developments on the Lithium Niobate Material Platform: The Silicon of Nonlinear Optics?, Invited

Thomas Graf, Universität Stuttgart, Germany, Efficient High-quality Processing of CFRP with a kW Ultrafast Thin-disk Laser, Invited

Min Gu, Swinburne University of Technology, Australia, Two-Beam Two-photon Lithography for Nanophotonics, Invited

F Omer Ilday, Bilkent University, Turkey, Nonlinearity Engineering of Ultrafast Lasers and Laser-Material Interactions, Invited

Ludmila Isaenko, V.S. Sobolev Institute of Geology and Mineralogy, Novosibirsk State University, Russia, Recent Study on Nonlinear Crystals, Invited

Xin Jiang, Max-Planck-Institute for the Science of Light, Germany, Deep-ultraviolet Light Generation in ZBLAN Photonic Crystal Fibre Pumped at 800 nm and 1042 nm, Invited

Peter Kazansky, University of Southampton, United Kingdom, Advances in Femtosecond Laser Nanostructuring in Glass: From Printed Geometrical Phase Optics to Eternal Data Storage, Invited

Christelle Kieleck, Deutsch-Französisches Forschungs Inst, France, Advances in Mid-infrared Nanosecond OPOs Directly Pumped by Tm3+-doped and Tm3+,Ho3+-codoped Fiber Lasers, Invited

Malte Kumkar, TRUMPF Laser- und Systemtechnik GmbH, Germany, Ultrafast Laser Machining of Transparent Materials: Process Development Supported by In-Situ Diagnostics, Invited

Sunao Kurimura, National Institute for Materials Science, Japan, Nonlinear optical waveguide for GaN-laser pumping, Invited

R. J. Dwayne Miller, MPI - the Structure and Dynamics/Matter, Germany, Picosecond Infrared Laser (PIRL) Scalpel: Achieving the Fundamental Limits to Minimally Invasive Surgery and Biodiagnostics, Invited

Hiroaki Minamide, RIKEN, Japan, Real-time Terahertz-wave Imaging Based on Nonlinear Optical Up-conversion, Invited

Eric Mottay, Amplitude Systemes, France, Industrial Ultrafast Lasers: Technology and Economics, Invited

Peter Schunemann, BAE Systems Inc, United States, New Nonlinear Optical Crystals for the Mid-Infrared, Invited

Marc Sentis, CNRS, France, Guidelines for Efficient Direct Ablation of Dielectrics with Single Femtosecond Pulses, Invited

Javier Solis, Instituto de Optica-CSIC, Spain, Ion Migration Assisted Femtosecond Laser Writing of Refractive Structures, Invited

Mauro Tonelli, Università degli Studi di Pisa, NEST Istituto Nanoscienza-CNR, Italy, Energy-transfer enhanced anti-Stokes cooling efficiency in Yb doped fluoride single crystals, Invited

Johann Troles, University of Rennes 1, France, Microstructured Chalcogenide Glass Fibers, Invited

Joris van Nunen, Coherent Inc, United States, Ultrafast Lasers enable Next Generation Batteries, Invited

Valérie Véniard, Ecole Polytechnique, CNRS, CEA-DSM, France, Recent Theoretical Studies in Nonlinear Crystals: Towards the Design of New Materials, Invited

Anthony Yu, NASA Goddard Space Flight C, United States, Fiber-Based Laser Transmitter Technology at 1.57 μm for Atmospheric Carbon Dioxide Satellite Remote Sensing, Invited

Minlin Zhong, Tsinghua University, China, Ultrafast Laser Enabling Versatile Micro-nano Scale Novel Fabrication, Invited
Peter Moulton, MIT Lincoln Laboratory, United States, Chair
Ruxin Li, Shanghai Inst. of Optics and Fine Mech., China, Chair
Richard Moncorge, Universite de Caen, France, ChairHans Joachim Eichler, Technische Universitat, Germany, Local Organizing Chair
  Applications
Dieter Hoffmann, Fraunhofer Institute for Laser Technology, Germany, Program Chair
Kurt Weingarten, JDSU Ultrafast Lasers, Switzerland, Program Chair
Juanita Anders, American Society for Laser Medicine & Surgery, United States
Brian Walter Baird, Summit Photonics, United States
Jiyeon Choi, KIMM, South Korea
François Courvoisier, FEMTO-ST Besançon, France
Thomas Graf, Institut für Strahlwerkzeuge (IFSW) Stuttgart, Germany
Ulrich Hefter, Rofin-Sinar Inc., Germany
Clemens Hoenninger, Amplitude Systems, France
Klaus Kleine, Coherent, United States
Karsten König, Univ. of Saarbrücken, Germany
Malte Kumkar, TRUMPF, Germany
Isamu Miyamoto, Institute of Laser Engineering - Osaka University, Japan
Upendra Singh, NASA Langley Research Center, United States
Holger Stiel, Max Born Institut Berlin, Germany
Carsten Welsch, University of Liverpool, United Kingdom

Materials
Benoit Boulanger, CNRS, France, Program Chair
Shibin Jiang, AdValue Photonics, Inc., United States, Program Chair
Gerard Aka, Ecole Nationale Supérieure de Chimie de Paris, France
Ady Arie, Tel-Aviv Univ., Israel
Joan Carvajal, Tarragona University, Spain
Jay Dawson, Lawrence Livermore National Lab, United States
Maxim Doroshenko, General Physics Inst. RAS, Russia
Helena Jelinkova, Czech Technical Univ., Czech Republic
Christian Kraenkel, Universität Hamburg, Germany
Pavel Loiko, Belarusian Natl Tech Univ., Belarus
Jacob Mackenzie, Univ. of Southampton, United Kingdom
Sergey Mirov, Univ. of Alabama at Birmingham, United States
Yasutake Ohishi, Toyota Technological Institute, Japan
Jasbinder Sanghera, US Naval Research Laboratory, United States
Jianda Shao, Shanghai Inst. of Optics and Fine Mech., China
Ichiro Shoji, Chuo Univ., Japan
Stefano Taccheo, Swansea Univ., United Kingdom
Takunori Taira, Institute for Molecular Science, Japan
Brian Walsh, NASA Langley Research Center, United States
Haohai Yu, Shandong Univ., China

Sources
Gregory Goodno, Northrop Grumman Aerospace Systems, United States, Program Chair
Alphan Sennaroglu, Koc University, Turkey, Program Chair
Sterling Backus, Kapteyn-Murnane Laboratories, United States
Weibiao Chen, Shanghai Inst. of Optics and Fine Mechanics, China
Frederic Druon, Laboratoire Charles Fabry, France
Majid Ebrahim-Zadeh, ICFO -The Institute of Photonic Sciences, Spain
Hans Joachim Eichler, Inst. of Optics and Atomic Physics, Technical Univ. of Berlin, Germany
Almantas Galvanauskas, Univ. of Michigan, United States
Eric Honea, Lockheed Martin Laser and Sensor Systems, United States
Stuart Jackson, Macquarie Univ., Australia
Yoonchan Jeong, Seoul National Univ., South Korea
Helen Pask, Macquarie Univ., Australia
Alan Petersen, Spectra-Physics, United States
Valentin Petrov, Max Born Institute, Germany
Thomas Schreiber, Fraunhofer IOF, Germany
Akira Shirakawa, Univ. of Electro-Communications, Japan
Ramesh Shori, Naval Air Warfare Ctr., United States
Thomas Sudmeyer, Université de Neuchâtel, Switzerland
Kanishka Tankala, Nufern, United States
Heping Zeng, East China Normal Univ., China

Industry Program Committee
Johannes Trbola, Laserline, Denmark, Program Chair
Neil Ball, DirectedLight, Inc., United States
Beth Cohen, IPG Photonics, United States
Bjorn Wedel, PT Photonic Tools GmbH, Germany
Welcome Refreshments
Join your fellow attendees for delectable fare and networking. The event is open to committee/presenting author/student and full conference attendees. Conference attendees may purchase extra tickets for their guest(s).

Student Poster Session and Reception (sponsored by IPG)
Student presenters will be presenting their research during this poster session. All student attendees are welcomed to participate and join the reception, dedicated networking. Beverages and light food will be served.

Poster Sessions
Posters are an integral part of the technical program and offer a unique networking opportunity, where presenters can discuss their results one-to-one with interested parties. Each author is provided with a board on which to display the summary and results of his or her paper.

Conference Banquet
Join your fellow attendees for a festive evening. The banquet also features a presentation in celebration of the International Year of Light.
 
short courses
student awards