International Optical Design Conference (IODC)

International Optical Design Conference (IODC)

Optical design remains a rapidly developing field due to the increased performance demands, improved software and computing platforms for modeling, better algorithms, and new fabrication technologies for better performance. The International Optical Design Conference (IODC), which occurs every four years, provides the most important meeting in optical design for engineers, scientists and designers to stay abreast of the changes in this field. Attendees from around the world in a breadth of optical design disciplines will be able to interact in both informal and formal settings.

Topics of special interest for IODC are illumination system fabrication, surface representation in lens design, desensitizing designs and reduction in cost, beam shaping, micro-optics, polarization, and computational imaging.

Kevin Rolland-Thompson, Synopsys, Inc, United States, Computational Imaging Challenges, Plenary

Rob Bates, FiveFocal LLC, United States, Digital Imaging System Design and Trade Space Analysis, Invited

Thomas Brown, The Institute of Optics, United States, Imaging the Polarization of a Light Field , Invited

Peter Clark, LensVector Inc, United States, Mobile Platform Optical Design, Invited

Alexander Epple, Carl Zeiss AG, Germany, Free Form Surfaces in Imaging Optics, Invited

Joseph Ford, University of California San Diego , United States, Telescope Contact Lenses and the Fiber-coupled Scale Model Eye , Invited

Andrew Harvey, University of Glasgow, United Kingdom, Title to be Determined, Invited

James Harvey, Photon Engineering LLC, United States, Integration of Optical Fabrication and Metrology into the Optical Design Process, Invited

Juan Carlos Miñano, Universidad Politecnica de Madrid, Spain, Anastigmatic Imaging with Unconstrained Object to Image Mapping, Invited

Thomas Nobis, Carl Zeiss AG, Germany, A Lens-resolved Approach for Analyzing and Correcting Secondary Axial Color, Invited

Richard Pfisterer, Photon Engineering LLC, United States, Color Correction Strategies in Optical Design, Invited

Jannick Rolland, University of Rochester, United States, The Pamplemousse: The Optical Design, Fabrication, and Assembly of a 3-mirror Freeform Imaging Telescope, Invited

Derek Sabatke, Ball Aerospace & Technologies, United States, Ray-tracing for Coordinate Knowledge in the JWST Integrated Science Instrument Module, Invited

Jose Sasian, University of Arizona, United States, Field Curvature Aberration: What is New?", Invited

Daniel Smith, Nikon Research Corporation of America, United States, Illumination in Microlithography - A Brief History, Invited

Michael Theisen, University of Rochester, United States, Phase Effects in Guided Mode Resonance Filters, Invited

Anthony Visconti, University of Rochester, United States, Stress-Induced Index Gradients in Optical Design, Invited

Chunyu Zhao, University of Arizona, United States, Design of Progressive Addition Lens with Newly Developed Curvature Polynomials, Invited


Mariana Figueiro, Rensselaer Polytechnic Institute, United States
Scott Lerner, Carl Zeiss AG, United States
Julius Muschaweck, Arnold & Richter Cine Technik GmbH & Co., Germany
John Rogers, Synopsys, Inc, United States


Dave Aikens, Savvy Optics Corp., United States
Miguel Alonso, University of Rochester, United States
Rob Bates, FiveFocal LLC, United States
Julie Bentley, , United States
Florian Bociort, Technische Universiteit Delft, Netherlands
Peter Brick, OSRAM Opto Semiconductors, Germany
Thomas Brown, The Institute of Optics, United States
Scott Cahall, Eastman Kodak Company, United States
William Cassarly, Synopsys, Inc, United States
Chier-Weei Chang, Industrial Technology Research Institute,
Russell Chipman, University of Arizona, United States
Peter Clark, LensVector Inc, United States
Josh Cobb, Corning Tropel Corporation, United States
Jim Contreras, Ball Aerospace & Technologies, United States
Jasmin Cote, Side by Side Optical Engineering, Canada
Marta De La Fuente, INDRA, Spain
J. Rufino Diaz-Uribe, Univ Nacional Autonoma de Mexico, Mexico
Alexander Epple, Carl Zeiss AG, Germany
Florian Fournier, , United States
Edward Freniere, Lambda Research Corporation, United States
G. Groot Gregory, Synopsys, Inc, United States
John Greivenkamp, University of Arizona, United States
Anurag Gupta, Google, United States
Lakshminarayan Hazra, University of Calcutta , India
Joseph Howard, NASA Goddard Space Flight Center, United States
Rainer Jetter, Optikentwicklung, Germany
Richard Juergens, Raytheon Missile Systems, United States
Norbert Kerwien, Carl Zeiss AG, Germany
David Kessler, Kessler Optics & Photonics Solutions,Ltd, United States
John Koshel, College of Optical Sciences/Univ Arizona, United States
Kenneth Kubala, FiveFocal, LLC, United States
Jay Kumler, JENOPTIK Optical Systems, LLC, United States
Wai-sze Tiffany Lam, University of Arizona, United States
Paul Leisher, nLight Corporation, United States
Rongguang Liang, University of Arizona, United States
Irina Livshits, , Russia
Virendra Mahajan, The Aerospace Corporation, United States
Daniel Malacara Hernandez, Centro de Investigaciones en Optica AC, Mexico
Stephan Malkmus, OSRAM, Germany
Paul Manhart, Sigma Space Corporation, United States
Romeo Mercado, RM Optical Design Consulting, United States
Paul Michaloski, Corning Advance Optics, United States
Michael Missig, Bausch & Lomb, Inc, United States
Kenneth Moore, Zemax, LLC, United States
Pantazis Mouroulis, Jet Propulsion Laboratory, United States
Iain Neil, Scotoptix, Switzerland
Thomas Nobis, Carl Zeiss AG,
Vladimir Oliker, Emory University, United States
Craig Olson, L-3 Communications, United States
Donald O'Shea, Georgia Institute of Technology, United States
Richard Pfisterer, Photon Engineering LLC, United States
Andrew Rakich, European Southern Observatory, Germany
Henning Rehn, Osram GmbH, Germany
Jannick Rolland, University of Rochester, United States
Kevin Rolland-Thompson, Synopsys, Inc, United States
Martha Rosete-Aguilar, Universidad Nacional Autonoma de Mexico, Mexico
Jose Sasian, University of Arizona, United States
David Shafer, , United States
Vesselin Shaoulov, University of Central Florida, United States
Narkis Shatz, Science Applications International Corp, United States
Bryan Stone, Synopsys, Inc, United States
Wilhelm Ulrich, Carl Zeiss AG, Germany
Sergio Vazquez-Montiel, Inst Nat Astrofisica Optica Electronica , Mexico
Yongtian Wang, Beijing Institute of Technology, China
Rolf Wartmann, Carl Zeiss Microimaging,
David Williamson, Nikon Research Corporation of America, United States
Andrew Wood, Qioptiq Ltd, United Kingdom
Akira Yabe, , Germany
Garam Young, Synopsys, Inc, United States
Richard Youngworth, Riyo LLC, United States
Maria Yzuel, Universitat Autonoma de Barcelona, Spain

Congress Special Events

General Session with Plenary Speakers
Monday, 23 June, 08:00 - 10:00
Salons II & IIII
The Joint Plenary Session will feature a speaker from each of the three topical meetings (COSI, IODC, and OF&T).  The Plenary Presenters are listed below.

How to Measure Everything, David Brady, Duke University, USA

Finding Life in the Universe: The Colossus Project, Jeff R. Kuhn; Institute for Astronomy, University of Hawaii, USA
Will Computational Imaging Change Lens Design?, Kevin P. Thompson, Synopsys, Inc., USA

Welcome Reception and Luau
Monday, 23 June, 18:00 – 20:00
The Coconut Grove at The Fairmont Orchid
Join us in the Coconut Grove for some of Hawaii’s best entertainment and island food. The reception luau is open to committee/presenting author/student and full conference attendees. Conference attendees may purchase extra tickets for their guest.
Joint Poster Session
Tuesday, 24 June, 18:00 - 20:00
Grand Ballroom Salon I & Pre-Function
Posters are an integral part of the technical program and offer a unique networking opportunity, where presenters can discuss their results one-to-one with interested parties. Each author is provided with a 4 ft. × 8 ft. (1.22 m × 2.44 m) board on which to display the summary and results of his or her paper.

IODC Panel Discussion: “I Wish They Wouldn’t do That”: Seeing Design/Fabrication from the Other Point of View”
Tuesday, 24 June,17:15 (Immediately following presentations in IODC Postdeadline Session)
Grand Ballroom Salon III
With a panel of experts from the optical fabrication industry and a room full of optical designers, a forum is provided for discussion of topics relating to basic design philosophy, the selection of tolerances, the communication of tolerances, and the communication of what is easy to achieve and what is hard to achieve.  (Do designers really place beamsplitters at 45 degrees just because the drafting table has a click-stop at 45 degrees? Are fabricators telling us it is hard when it is really easy, just to make life simple for themselves?)  Bring your long-standing complaints with you to this session, but also be prepared to see the problem from the other point of view!

  • Jessica DeGroote Nelson, Optimax Systems, USA
  • Tolis Deslis, Jenoptik Optical Systems, USA
  • Cody Kreischer, Kreischer Optics, USA
  • Marc Tricard, Zygo Corp., USA
  • Paul Dumas, QED Technologies, Inc., USA

Michael Kidger Memorial Scholarship Award and Illumination Problems and Lens Design Presentations
Wednesday, 25 June, 18:00 - 20:00
Salon III
The Michael Kidger Memorial Scholarship Award will be presented to Brian Wheelwright prior to the Lens Design and Illumination Problems Presentations in Salon III.  The 2014 Kidger scholarship award will be presented to Brian by Kevin P Thompson, Synopsys Inc. USA. The award consists of a $5,000 cash grant supported by the Michael Kidger Memorial Scholarship Fund.

Following the presentation of the Kidger Award, the winners of the Illumination and Lens Design Problems will present their solutions.

Topic Categories 

  1. Lens Design (Freeform Optics)
    • Adaptive optics in optical systems
    • Astronomical optics
    • Conformal optics
    • Diffractive and holographic optics
    • Freeform and asymmetric optics
    • Gradient index optics
    • Lithographic optics
    • Liquid optics
    • Micro- and nano-optics
    • Optical design with freeform surfaces
    • Phase coded optics in digital imaging
    • Space-borne optics
    • Vision testing and enhancement optics
    • Zoom optics and multi-configuration optics
    • New lens designs
  2. Illumination Design
    • Theory for illumination/lighting design
    • Radiometry and photometry
    • Optical design with stray light as a consideration
    • Optical design with color in illumination systems: tracing, color mixing, displaying, etc.
    • Illumination optics (non-imaging concepts, freeform) design: mathematical representation, modeling, optimization, manufacture and metrology
    • Applications in illumination, display, solar, and nonimaging optics
    • Lighting: architectural, roadway, etc.
    • Displays: backlit, projection, etc.
    • Solar: concentrators, flat panel, etc.
    • Nonimaging: lightpipes, freeform, etc.
    • Light shaping components (energy diffusers)
    • Source modeling: LEDs, HID, fluorescent, incandescent, etc.
    • Solid-state lighting design
    • Optical design specifications and requirements for human visual systems
    • Optical design specifications and requirements for non-visual effects of light
    • Rendering and visualization: simulation of environments to determine effectiveness of light for visual and non-visual systems. Software for rendering
  3. System Design
    • Beam shaping optics
    • Beam splitting gratings
    • Computational imaging and digital processing
    • High-power laser system optics
    • Image performance criteria and aberration correction for digital photography
    • Instrument design
    • IR systems
    • Medical/bio-optics
    • Micro-electro-mechanical systems (MEMS)
    • Ophthalmic optics and instruments
    • Optical data storage systems
    • Photonic and optical interconnect systems
    • Special beams: vortex beams, Bessel Gauss beams, Ince Gauss beams, etc.
    • Telecommunications optics
    • X-ray systems
  4. Fabrication & Testing Design
    • Desensitizing designs and reduction in cost
    • Fabrication and testing developments that expand the design horizon
    • Integration of design, manufacturing, and metrology
    • Materials (glass and other) and material characterization
    • Plastic and molded optics
    • Thin film coatings in optical designs
    • Testing and alignment of optical surfaces and systems
    • Tolerance generation and application
    • Zernike coefficients: advantages and deficiencies
  5. Software Design
    • Advances in optical design software
    • Beam propagation
    • Physical optics modeling and design methods
    • Optimization developments in local and global methods
    • Theory and mathematical methods applied to optical design including new optical surface descriptions
    • Tolerancing of optical surfaces manufactured by subaperture processes
    • Visualization and virtual-reality optical systems
  6. Polarization and Coherence in Optical Design
    • Algorithms for polarization ray tracing
    • Simultaneous optimization of coating and optical designs
    • Ultra-low polarization optical designs, polarization aberration balancing
    • Optical design with anisotropic materials
    • Polarization aberrations, vector Zernike and other polynomials
    • Coherence analysis, estimating speckle statistics
  7. Other
    • Education in optics, optical design and optical system modeling
    • History of optics and optical design
    • Mathematical theory and techniques
    • Standards
    • Other topics

2014 Short Course Schedule

Sunday, 22 June, 09:00-12:00
SC415 Making Sense of Waviness and Roughness on Optics
SC418 Optical Materials, Fabrication and the Testing for the Optical Engineer

Sunday, 22 June, 17:00-20:00
SC417 Evaluating Aspheres for Manufacturability

2014 Short Course Descriptions

SC415 Making Sense of Waviness and Roughness on Optics

Dave Aikens, Savvy Optics Corp, USA
Sunday, 22 June, 09:00 - 12:00

Course Description
The surface texture of a polished optical surface is an important, if misunderstood, surface property. This course is designed to bring photonics personnel up to an immediate working knowledge on surface texture specifications and the impact surface roughness and waviness can have on an optical system.  Surface roughness causes scatter and system transmission loss, while waviness and mid-spatial frequency ripple can cause loss of resolution, image quality, veiling glare, beam modulation and a host of other issues.
Until recently, surface texture could be safely described by a single number, RMS roughness, following MIL-STD-10A, since most polished optical surfaces were manufactured using the same slurry-pitch process that had existed for decades. In the past 30 years, however, new manufacturing technologies have evolved using molding, diamond turning, synthetic lap polishing and deterministic figuring which have dramatically altered the surface finish of optics. In order to control the resultant surface texture errors, new specifications like gradients, correlation values, PSDs and MSF waviness specifications have been introduced. Most users do not completely understand these new notations however, and the meaning of even a simple RMS roughness specification has become obscure, or even meaningless.
The course defines the terms and parameters used to control surface texture in the modern optical manufacturing world. The potential performance impact of surface texture errors will be covered, and some specific case studies will be used to show the impact of various amplitudes of these errors on precision optical instrument performance. The national and international standards are introduced, and the derivation of meaningful specification for texture and waviness for common applications is discussed. Finally, the identification, measurement and reduction of these manufacturing errors is treated.

Benefits and Learning Objectives
This course should enable participants to:
  • Describe the surface texture of a polished optical surface based on its specifications
  • Understand the meaning of a Power Spectral Density plot
  • Quantify the requirements for surface texture using PSD and gradient notations
  • Predict the impact of mid-spatial frequency ripple and roughness on system performance
  • Compose a meaningful surface texture specification for both waviness and roughness
  • Identify waviness surface errors in measurement data
Intended Audience
This course is intended for engineers, managers and experienced technicians working in optical design, manufacturing, metrology and quality control and assurance.  Anyone who is responsible for specifying or interpreting surface roughness and waviness specifications will find it extremely useful. Some understanding of algebra is beneficial. 

Dave Aikens has been writing on the subject of surface texture and ripple for more than 20 years and is one of the foremost experts on optics mid-spatial frequency waviness today.  Dave is President and founder of Savvy Optics Corp., is the head of the American delegation to ISO TC 172 SC1, and is Executive Director of the Optics and Electro-Optics Standards Council. He also served as the project manager for the current ISO surface texture notation standards for optics.

SC417 Evaluating Aspheres for Manufacturability

Paul Dumas, QED Technologies, Inc., USA
Sunday, 22 June, 17:00 -20:00

Course Level
Advanced Beginner
Course Description
This course provides an overview of how aspheric surfaces are designed, manufactured, and measured. The primary goal of this course is to teach how to determine whether a particular aspheric surface design will be difficult to make and/or test. This will facilitate cost/performance trade off discussions between designers, fabricators, and metrologists.

We will begin with a discussion of what an asphere is and how they benefit optical designs. Next we will explain various asphere geometry characteristics, especially how to evaluate local curvature plots. We will also review flaws of the standard polynomial representation, and how the Forbes polynomials can simplify asphere analysis. Then we will discuss how various specifications (such as figure error and local slope) can influence the difficulty of manufacturing an asphere. Optical assembly tolerances, however, are beyond the scope of this course - we will focus on individual elements (lenses / mirrors).

The latter half of the course will focus on the more common technologies used to generate, polish, and/or measure aspheric surfaces (e.g. diamond turning, glass molding, pad polishing, interferometry). We'll give an overview of a few generic manufacturing processes (e.g. generate-polish-measure). Then we'll review the main strengths and weaknesses of each technology in the context of cost-effective asphere manufacturing.
Benefits and Learning Objectives
This course will enable you to:

  • Identify the most important metrics of aspheric shape that relate to manufacturability
  • Evaluate key characteristics of an aspheric surface to determine whether an asphere will be difficult to manufacture and/or test
  • Describe how Forbes polynomials can simplify asphere interpretation
  • Interpret an aspheric prescription from an optical component print
  • List common ways aspheres are manufactured and tested
  • Answer the question "Which technologies are best suited to manufacture this asphere?"
Intended Audience
This material is intended for engineers, optical designers, and managers who want an overview of the benefits and challenges associated with manufacturing aspheric surfaces for use in optical systems. It will be of benefit for specialists in a particular area (e.g. design, manufacturing, or testing), as it will give a broad overview in all three of those areas with a focus on aspheric surfaces. It is intended to facilitate communication between designers, fabricators, and testers of aspheric surfaces.
Instructor Biography
Paul Dumas is one of the founding members of QED Technologies, where he has developed software and processes for aspheric optical manufacturing.  He received his B.S. and M.S. in Optics from The Institute of Optics at the University of Rochester. In the early 1990s, and since has managed various engineering groups throughout the company's history, including Software, Systems, and Applications.

SC418 Optical Materials, Fabrication and the Testing for the Optical Engineer

Jessica Nelson, Optimax SI, USA
Sunday, 22 June, 09:00-12:00

This course is designed to give the optical engineer or lens designer an introduction to the technologies and techniques of optical materials, fabrication and testing.  This knowledge will help the optical engineer understand which optical specifications/tolerances lead to more cost effective optical components. Topics covered include optical materials, traditional, CNC and novel optical fabrication technologies, surface testing and fabrication tolerances. 

Course Level

Benefits and Learning Objectives

This course will enable you to:

  • Identify key mechanical, chemical and thermal properties of optical materials (glass, crystals and ceramics) and how they affect the optical system performance and cost of optical components
  • Understand the basics of optical fabrication
  • Define meaningful surface tolerances
  • Communicate with optical fabricators
  • Design optical components that are able to be manufactured and measured using state of the art optical fabrication technologies
Intended Audience
Optical engineers, lens designers, or managers who wish to learn more about how optical materials, fabrication and testing affect the optical designer. Undergraduate training in engineering or science is assumed.
Jessica DeGroote Nelson is the R&D manager and scientist at Optimax Systems, Inc.  She specializes in optical materials and fabrication processes.  She is an adjunct faculty member at The Institute of Optics at the University of Rochester teaching an undergraduate course on Optical Fabrication and Testing, and has given several guest lectures on optical metrology methods.  She earned a Ph.D. in Optics at The Institute of Optics at the University and SPIE.
How to Measure Everything, David Brady, Duke University, USA

Abstract: The ideal camera measures wide-field diffraction-limited images of the full focal stack with photon-limited spectral and temporal resolution and infinite dynamic range. Multiscale optics and compressive coding may bring practical cameras close to this limit.

Bio: David Brady is the Michael J. Fitzpatrick Endowed Professor of Photonics at Duke University, where he leads the Duke Imaging and Spectroscopy Program. Brady's contributions to computational imaging systems include lensless white light tomography, optical projection tomography, compressive holography, reference structure tomography, coded aperture snapshot spectral imaging and coded aperture x-ray scatter imaging. He is the principal investigator for the DARPA AWARE Wide Field of View project, which aims to build compact streaming gigapixel scale imagers and the DARPA Knowledge Enhanced Exapixel Photography project, which focuses on code design for high pixel count spectral imagers. He is the author of Optical Imaging and Spectroscopy  (Wiley-OSA, 2009) and is a Fellow of IEEE, SPIE and OSA and was the 2013 winner of the SPIE Dennis Gabor Award.

Finding Life in the Universe: The Colossus Project, Jeff R. Kuhn; Institute for Astronomy, University of Hawaii, USA

Abstract: Work progresses on the design of a sixty by 8-meter diameter telescope. This 77+ m diameter, optically phase controlled, almost-filled aperture interferometer can see atmospheric biomarkers and even the thermal footprints from Earth-like civilizations on exoplanets. This talk describes the motivation, enabling new technologies, and status of the group now planning the Colossus telescope.

Bio: Jeff Kuhn is an optical scientist and teacher. He earned his physics PhD from Princeton, and spent the last three decades as a professor of physics, or astrophysics at: Princeton, Michigan State, and the University of Hawaii. He was science head for the National Solar Observatory at Sunspot NM. and the director of the Institute for Astronomy on Maui for a decade. He's written over 200 papers on subjects ranging from gravitational radiation to novel instrumentation.  He has been the recipient of a Sloan Foundation Grant and a Senior Humboldt Prize from Germany.  Some of the optical concepts he's written about are now core technologies for telescopes under construction, like the Advanced Technology Solar Telescope on Haleakala and the Giant Magellan Telescope. He is a founder of the Colossus Project -- a public and private consortium now designing an instrument to find Earth-like civilizations in the galactic solar neighborhood. Jeff lives on Maui where he researches and teaches at the Institute for Astronomy, University of Hawaii.

Will Computational Imaging Change Lens Design?, Kevin P. Thompson, Synopsys, Inc., USA
Abstract: Computational imaging is changing the landscape in many dimensions.  If extended depth of focus is leveraged to allow curved image surfaces, the lens design environment changes dramatically.  This talk will highlight this potential new world.
Bio: Kevin P. Thompson, Ph.D. is the Group Director of R&D/Optics at Synopsys Inc. and a Visiting Scientist at the University of Rochester, Institute of Optics.  Dr. Thompson’s primary technical expertise is as a lens designer and aberration theorist, particularly for optical systems without symmetry including head worn displays, EUV lithography projection and illumination optics, and advanced reconnaissance systems.  Dr. Thompson joined Optical Research Associates (now part of Synopsys) as an optical designer in 1986 after 5 years with the optical design group at Perkin-Elmer's government division.  Kevin conducted his PhD research with Prof. Roland Shack at the College of Optical Sciences where he developed Nodal Aberration Theory (NAT), the optical aberration field descriptions for optical systems without positional symmetry, which was recently discovered to also be the aberration theory for the emerging field of freeform optics.  Kevin is an OSA Fellow, a Fellow of the SPIE, and the 2013 recipient of the 2013 SPIE A.E. Conrady award.