Advanced Solid-State Lasers

Advanced Solid-State Lasers

27 October - 01 November 2013
Paris Marriott Rive Gauche Hotel and Convention Center, Paris, France

This new congress combines the significant research from the topical meetings formally known as Advanced Solid-State Photonics (ASSP), Advances in Optical Materials (AIOM), and Fiber Laser Applications (FILAS).

This exciting new program covers the latest advances in solid state materials based lasers, to nonlinear optical devices and associate technologies and applications.

Attend sessions and network with colleagues to learn:

  • What are the new or improved materials on the horizon and what is needed in the future?
  • What are the performance requirements for new laser sources?
  • What new technologies and applications are needed to meet evolving needs in the market place?

This is the only international event presenting materials, sources, and applications all in one meeting in a single track format.

Materials are the basis for the technology covered by ASSL, and the meeting encompasses advances in optics, materials science, condensed matter physics and chemistry relevant to the development, characterization and applications of new optical materials. These include bulk crystals, glasses and ceramics, as well as micro-structured materials such as optical fibers, planar waveguides, and periodically patterned non-linear crystals. Materials used in the mid IR including both crystalline and non-crystalline and their application to the development of mid IR fiber lasers will be presented.
  • Laser crystals
  • Transparent ceramics
  • Crystal and glass fibers
  • Nonlinear crystals and processes
  • Waveguides and laser patterning
  • Photonic structures
Materials used in:
  • Solid-state lasers
  • Fiber lasers
  • Supercontinuum generation
  • Scintillators,
  • Lighting and Laser displays,
  • Solar converters
  • Sensors and detectors,
  • Windows, lenses, domes
Coherent and high brightness radiation sources include lasers as well as pump and nonlinear devices. In this component, the emphasis is on advances in the source science and technology, aimed at some combination of improved power, efficiency and brightness, increased wavelength coverage, narrower and more stable frequencies and, for pulsed sources, shorter pulse widths.
  • High power cw and pulsed fiber lasers
  • IR, visible and UV fiber lasers
  • Diode-Pumped Lasers
  • Fiber Lasers
  • Ceramic Lasers
  • High-Power Lasers
  • Laser beam combining
  • Short-Pulse Lasers
  • Frequency-Stable Lasers
  • Microchip and Compact Lasers
  • Tunable and New Wavelength Solid-State Lasers
  • Optically Pumped Semiconductor Lasers
  • High-Brightness Diodes
  • Optical Sources Based on Nonlinear Frequency Conversion Schemes
Applications cover ways in which the advances in materials and sources highlighted by ASSL have an important impact on science and industry. Specific topics emphasized may vary from one meeting to the next, but, beyond science, may include materials processing including cutting and marking, advanced lithography, energy, metrology, welding, astronomy, security and medicine.

Lasers used for;
  • Cutting, precision marking, and welding applications
  • Sintering and powder deposition
  • Laser processing inphotovoltics, microelectronics, and flat panel displays
  • Femtosecond optical micromachining
  • Homeland security and perimeter monitoring
  • Directed energy applications
  • Metrology, including optical frequency combs
  • Medicine and Biological applications
  • Astronomical applications including gravity wave detection and laser guide star
Serge Haroche, 2012 Nobel Prize in Physics
Ecole Normale Supérieure and Collège de France, France
Juggling with Photons in a Box to Explore the Quantum World - PLENARY

Gérard Mourou, IZEST Center at Ecole Polytechnique, France
Can the Future of Accelerators Be Fibers? The Optics Road to GeV Scientific and Societal Applications - PLENARY

Antonio Agnesi, Universita degli Studi di Pavia, Italy, ps MOPA DPSSLs and Mid-IR Conversion, Invited

Craig Benko, University of Colorado at Boulder JILA, United States, Phase Coherent Extreme Ultraviolet Radiation, Invited

Stephan Bruening, Schepers GmbH & Co. KG, Germany, 3D laser micro processing of Large Scale Metal Surfaces with Fast Pulsed Fiber Lasers, Invited

Patrice Camy, CIMAP, France, Fluoride Planar Waveguide Lasers, Invited

Lionel Canioni, Université de Bordeaux I, France, Femtosecond Direct Laser Writing of Linear and Nonlinear Optical Properties in Photosensitive Glass, Invited

Alexander Gaeta, Cornell University, United States, Modelocking and Femtosecond Pulse Generation in Chip-Based Frequency Combs, Invited

Philippe Goldner, LCMCP UMR 7574, France, Rare Earth Doped Crystals and Ceramics for Coherent Information Processing, Invited

Ingmar Hartl, DESY, Germany, Thulium-fiber Laser Driven Mid-infrared Frequency Combs, Invited

Marco Hornung, Helmholtz Institute Jena, Germany, Highest Intensity Diode Pumped Solid State Laser System, Invited

Akio Ikesue, World Lab Co. Ltd, Japan, Technological Innovations in Optical Ceramics, Invited

FRANZ KAERTNER, Massachusetts Institute of Technology, United States, High Energy Sub-cycle Optical Waveform Synthesizer, Invited

Ursula Keller, ETH Zurich, Switzerland, Compact Gigahertz Frequency Combs, Invited

Tobias Kippenberg, Ecole Polytechnique Federale de Lausanne, Switzerland, Temporal Solitons for Frequency Comb Generation in Optical Microresonators, Invited

Jens Limpert, Friedrich-Schiller-Universität Jena, Germany, Understanding and Mitigation of Modal Instabilities in High Power Fiber Laser and Amplifiers, Invited

Jacob Mackenzie, University of Southampton, United Kingdom, Planar Waveguides, a Power Scaling Architecture for Weak Quasi-four-level Lasers, Invited

Carlos Molpeceres, Universidad Politecnica de Madrid, Spain, Laser Processes for Contact Optimization in c-Si Solar Cells, Invited

Eric Mottay, Amplitude Systemes, France, Industrial Ultrafast Lasers, Invited

Johan Nilsson, University of Southampton, United Kingdom, Tandem-pumped Fiber Lasers with Low Quantum Defect, Invited

Yasutake Ohishi, Toyota Technological Institute, Japan, Supercontinuum Generation in Highly Non-linear Fibers, Invited

Takashige Omatsu, Chiba University, Japan, Optical Vortex Lasers for Chiral Material Science, Invited

Markus Pollnau, Universiteit Twente, Netherlands, Dual-wavelength Narrow-linewidth Lasers and their Applications, Invited

Mathew Rekow, Eolite Lasers, United States, Tailored Pulse Laser Changes the Rules for PCB and Flex Circuit Materials Processing, Invited

Daniel Rytz, FEE Gmbh, Germany, Properties of YAB Crystals for Frequency Conversion to the UV, Invited

Evgeni Sorokin, Technische Universität Wien, Austria, Mid-Infrared Femtosecond Laser, Invited

Xutang Tao, Shandong University, China, Crystal growth , phase relationship , Raman and Self-frequency-doubled Raman Laser of BaTeMo2O9, Invited

John Travers, Max-Planck-Inst Physik des Lichts, Germany, Frequency Conversion and Compression of Ultrashort Pulses in Gas-filled Hollow-core Photonic Crystal Fibres, Invited

Neil Ball, Directed Light Inc., United States, Industrial Laser Industry, Moderator

Philippe Brak, Raydiance Inc, United States, Ultrafast Lasers for Manufacturing Solutions, Panelist

Award Winning Chairs

Peter Moulton, Q-Peak, Inc., USA, 2013 IEEE Photonics Award
Guenter Huber, Universität Hamburg, Germany, 2013 OSA Charles Townes Award


Valentin Gapontsev, IPG Photonics Corp., USA, Program Chair
Francois Salin, EOLITE, France, Program Chair
Michael O'Connor, IPG Photonics Corp., USA
Nasser Peyghambarian, University of Arizona, USA
Jose Salcedo, Multiwave Photonics, Portugal
Stefan NOLTE, Institut of Applied Physics, Univ. Jena, Germany
Ulrich Hefter, Rofin-Sinar, Germany
David Pureur, Quantel, France
Jyrki Latokartano, Tampere University of Technology, Finland
Brian Baird, Summit Photonics, USA
Bill Shiner, IPG Photonics Corp, USA
Martin Richardson, CREOL, USA
Mark Hueske, LPKF, Germany
Zhu Xiao, laser.HUST Wuhan, China
Clemens Hoenninger, Amplitude Systems, France
Udo Klotzbach, Fraunhofer IWS, Germany
Almantas Galvasnauskas, Univ. of Michigan, USA
Haibin Zhang, ESI, USA

Richard Moncorge, Université de Caen, France, Program Chair
Shibin Jiang, AdValue Photonics Inc., USA, Program Chair
Jean-Luc Adam, Universite de Rennes I, France
Gerard Aka, Ecole Natl Superieure de Chimie de Paris, France
John Ballato, Clemson University, USA
Jes Broeng, Danmarks Tekniske Universitet, Denmark
Maxim E. Doroshenko, A.M. Prokhorov General Physics Inst RAS, Russia
Helena Jelinkova, Czech Technical University in Prague, Czech Republic
Ajoy Kumar Kar, Heriot-Watt University, UK
Christian Kraenkel, Universität Hamburg, Germany
Sergey B. Mirov, University of Alabama at Birmingham, USA
JianRong Qiu, South China University of Technology, China
Jasbinder S. Sanghera, US Naval Research Laboratory, USA
Kathleen I. Schaffers, Lawrence Livermore National Laboratory, USA
Kenneth L. Schepler, US Air Force, USA
Peter G. Schunemann, BAE Systems Inc, USA
Jianda Shao, Shanghai Inst of Optics and Fine Mech, China
Takunori Taira, Institute for Molecular Science, Japan
Mauro Tonelli, Università degli Studi di Pisa, Italy
Brian M. Walsh, NASA Langley Research Center, USA
Carlos L. Zaldo, Consejo Sup Investigaciones Cientificas, Spain
John M. Zavada, National Science Foundation, USA

Gregory D. Goodno, Northrop Grumman Aerospace Systems, USA, Program Chair
Alphan Sennaroglu, Koc University, Turkey, Program Chair
Andrius Baltuska, Technische Universität Wien, Austria
Liang Dong, Clemson University, USA
Mark A. Dubinskii, US Army Research Laboratory, USA
Majid Ebrahim-Zadeh, Institut de Ciencies Fotoniques, Spain
Marc Eichhorn, Inst Franco-Allemand Recherches St Louis, France
Katia Gallo, Royal Institute of Technology - KTH, Sweden
Jennifer E. Hastie, University of Strathclyde, UK
F Oemer Omer Ilday, Bilkent Universitesi, Turkey
Yoonchan Jeong, Seoul National University, South Korea
Jason Jones, University of Arizona, USA
Junji Kawanaka, Osaka University, Japan
Sunao Kurimura, National Institute for Materials Science, Japan
Valentin Petrov, Max Born Institute, Germany
Thomas Schreiber, Fraunhofer IOF, Germany
Scott D. Setzler, BAE Systems PLC, USA
Akira Shirakawa, University of Electro-Communications, Japan
Thomas Sudmeyer, University of Neuchatel, Switzerland

Plenary Session
Serge Haroche, Ecole Normale Superieure and College de France, France
Gerard Mourou, IZESR, Ecole Polytechnique, France
Download the Program Book for more details

Conference Banquet
Charles Hirlimann, European Union Relationship CNRS International Cooperation Office, France, A Strange Instrument: the Fabry‐ Pérot Interferometer
Download the Program Book for more details

ASSL Industry Program Keynote Speaker
Eric Mottay, Amplitude Systemes, France, Industrial Ultrafast Lasers
Download the Program Book for more details

ASSL Industry Program Panel
These industry experts will discuss opportunities and the wide variety of applications in Medical Device, Aerospace and Automotive. In addition they will provide insight into new laser technology and successful business strategy from large business to small contract manufacturers.

Executive Speaker Series
OSA’s Corporate Associates invite you to a special Interview featuring Philippe Brégi, President and CEO, Egide Group.
Download the Program Book for more details

National Photonics Initiative
Gregory J. Quarles, Optoelectronics Management Network, USA
Download the Program Book for more details

OIDA Program on Industrial Lasers
Download the Program Book for more details

VIP Networking Event: Connecting Corporate Executives, Recent Graduates and Students
This session brings together Industry Executives to share their business experience – from how they started their careers and lessons learned along the way, to using their degree in an executive position.

SC290 High-power Fiber Lasers and Amplifiers

Johan Nilsson, Optoelectronics Research Ctr., Univ. of Southampton, UK

Course Level: Advanced Beginner (basic understanding of topic is necessary to follow course material)

Course Description: This course describes the principles and capabilities of high power fiber lasers and amplifiers, with output powers that can exceed a kilowatt. It describes the fundamentals of such devices and discusses current state of the art and research directions of this rapidly advancing field. Fiber technology, pump laser requirements and input coupling will be addressed. Rare-earth-doped fiber devices are the focus of the course, but Raman lasers and amplifiers will be considered, too, if time allows. This includes Yb-doped fibers at 1.0 - 1.1 μm, Er-doped fibers at 1.5 - 1.6 μm, and Tm-doped fibers at around 2 μm. Operating regimes extending from continuous-wave single-frequency to short pulses will be considered. Key equations will be introduced to find limits and identify critical parameters. For example, pump brightness is a critical parameter for some devices in some regimes but not always. Important limitations relate to nonlinear and thermal effects, as well as damage, energy storage and, of course, materials. Methods to mitigate limitations in different operating regimes will be discussed. Fiber, laser and amplifiers designs for different operating regimes will be described.

Intended Audience: This course is intended for scientists and engineers involved or interested in commercial and military high power fiber systems. This includes system designers, laser designers, fiber fabricators, and users. A basic knowledge of fibers and lasers is needed

Benefits and Learning Objectives
After completion of this short course the participant will be able to:

  • Describe the fundamentals of high power fiber lasers and amplifiers.
  • List key strengths, relative merits, and specific capabilities of high power fiber lasers and amplifiers.
  • Assess performance limitations and describe the underlying physical reasons in different operating regimes.
  • Design or specify basic fiber properties for specific operating regimes.
  • Describe the possibilities, limitations, and implications of current technology regarding core size and rare earth concentration of doped fibers.
  • Discuss different options for suppressing detrimental nonlinearities.
  • Design basic high power fiber lasers and amplifier systems.
  • List strengths and weaknesses of different pumping schemes.


SC406 Nonlinear Effects in Fibers

Thomas Schreiber, Fraunhofer IOF Jena, Germany

Course description:The extended nonlinear Schrödinger equation (NLSE) is the basic equation for the description of optical pulse propagation in fibers that experience various linear and nonlinear effects. The course will first focus on the basic effect and its understanding described by this equation like pulse broadening, spectral broadening (SPM, FWM, optical wave breaking), soliton effects, stimulated Raman scattering, supercontinuum generation, pulse amplification and pulse compression. Additionally, the fundamentals to numerically solve the equations are described. In a second part, the laser rate equations that can be applied to active fiber amplifier systems are discussed. Relevant effects that can be studied with the combination of the rate equation and nonlinear Schrödinger equation are introduces, for example, saturation of fiber amplifiers, broadband amplification, ASE background and noise and pump conditions. Furthermore, inelastic scattering processes of Brillouin and Raman scattering are considered. Finally, system designs, for instance short pulse fiber oscillators, are considered, where different fiber optical elements affect the output.

Intended Audience: This course would be useful to anyone working with fibers and is interested in understanding and predicting laboratory results.
Benefits and Learning Objectives
This course should enable you to:

  • describe  the basics of the nonlinear Schrödinger Equation and laser rate equations
  • compute and discuss the numerical solution to these equations, like the Split-Step Method
  • determine numerical stability issues
  • design fiber optics setups regarding nonlinear effects