Mordechai Rothschild earned his BS degree in physics from Bar-Ilan University and a Ph.D. in optics from the University of Rochester.

Rothschild is the leader of the Advanced Materials and Microsystems Group at MIT’s Lincoln Laboratory. He leads programs in metamaterials, microfluidics, and nanofabrication. He has also managed programs to develop multifunctional microsystems combining optics, mechanics, and microfluidics. Previously, he played a leading role in the development of advanced optical lithography technologies, including 193-nm and liquid-immersion lithography.

Rothschild has authored or co-authored more than 220 papers and conference proceedings in the fields of photochemistry, spectroscopy, lithography, nanodevices, and chemical detection. He is also the co-inventor of 16 patented technologies. He co-chaired the 2012 Lithography Workshop, and he is a member of the program committee of the International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication. He is the recipient of the 2014 SPIE Frits Zernike Award in Lithography and of the 2015 Edwin H. Land medal awarded jointly by the Society for Imaging Science and Technology and OSA.