Gamma, X-Ray and Extreme UV Optics (FX)


Gamma, X-Ray and Extreme UV Optics (FX)

This group explores design, characterization, fabrication, and calibration of X-ray, gamma, and EUV optics (including multilayer optics) for applications in the fields of photolithography, synchrotron radiation, free-electron lasers, astronomy, and others.



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OSA International Workshop on Compact EUV & X-ray Light Sources, 30-31 October 2014.

This workshop is a follow-up to the recent OSA Compact EUV and X-Ray Light Sources Incubator Meeting, which was held in November 2013.
 
The Workshop will be held at the Omni Shoreham Hotel in Washington, DC, is collocated with the 2014 International Symposium on Extreme Ultraviolet Lithography.
 
The goal of this workshop is to build upon the momentum and the enthusiasm created by the past OSA Incubator to gather both the compact light source developers, potential users, and others interested in this new field to present their work, exchange ideas, and to network with colleagues with diverse needs and interests.