The Optical Society Announces 2017 Class of Senior Members

16 May 2017

The Optical Society Announces 2017 Class of Senior Members


WASHINGTON — The Optical Society (OSA) Board of Directors is pleased to announce the approval of 182 new Senior Members — an OSA distinction that provides well-established individuals recognition for their experience and professional accomplishments within the field of optics and photonics. The 182 Senior Members were announced today at the CLEO 2017. A listing of the newly inducted OSA Senior Members appears below.

“The Optical Society welcomes this year’s Senior Class and congratulates these members for their contributions to our global community,” said Eric Mazur, president of The Optical Society and OSA Fellow. “The 2017 class join a distinguished group of scientists, engineers, entrepreneurs and innovators who have demonstrated exemplary professional accomplishments in optics and photonics.”

To qualify for OSA Senior Membership, individuals must have at least ten years of significant professional experience in the field, an active OSA Membership and two endorsement statements from current OSA Members. Requests are reviewed by OSA’s Member and Education Services Council, which then recommends candidates to the Board of Directors for approval.
 
Senior Members receive the full complement of OSA Member benefits and services, plus:
  • Special Recognitions – Senior Members are identified in the OSA Individual Directory, on OSA.org and during OSA-hosted events.
  • Announcements – In addition to this news release, newly-approved Senior Members are announced in:  Optics & Photonics News and the OSA Member e-newsletter.
  • Senior Member Certificate and Lapel Pin – Recognition materials are distributed upon request approval.
  • Letter of Recognition – Approved Senior Members may request that a confirmation letter be sent to their employer.

Following is an alphabetical listing of the 182 Senior Members announced at CLEO:
  • John Abbott, Corning Research & Development Corp, USA
  • Abraham Aharoni, NetaCo Ltd., Israel
  • Kinjiro Amano, University of Manchester, UK
  • Tatiana Amotchkina, Max-Plack Institut fur Quantenoptik, Germany
  • Lucio Claudio Andreani, University of Pavia, Italy
  • Matthew Arnold, University of Technology Sydney, Australia
  • Maximino Avendaño-Alejo, Universidad Nacional Autónoma de México, Mexico
  • Sasa Bajt, Deutsches Elektronen-Synchrotron (DESY), Germany
  • Jiming Bao, University of Houston, USA
  • Christoph Baranec, University of Hawai‘i at Mānoa, USA
  • Kenneth Barnard, US Air Force Research Laboratory, USA
  • Tymon Barwicz, IBM TJ Watson Research Center, USA
  • Ildar Begishev, University of Rochester, USA
  • Kevin Belfield, New Jersey Institute of Technology, USA
  • Ralf Bergmann, BIAS, Germany
  • Scott Bickham, Corning Research & Development Corp, USA
  • Wim Bogaerts, Universiteit Gent, Belgium
  • Adonis Bogris, Technological Educational Institute of Athens, Greece
  • Stefano Bottacchi, HHI-Fraunhofer, Italy
  • Philippe Bouyer, Institut d’Optique, France
  • Daniel Boye, Davidson College, USA
  • Stefan Breuer, Technische Universität Darmstadt, Germany
  • Eric Buckland, Bioptigen Inc., USA
  • Juan Bueno, Universidad de Murcia, Spain
  • Jan Burke, Fraunhofer IOSB, Germany
  • Joshua Caldwell, US Naval Research Laboratory, USA
  • Sergio Calixto, Centro de Investigaciones en Optica AC, Mexico
  • David Caplan, MIT Lincoln Laboratory, USA
  • Artur Carnicer, Universitat de Barcelona, Spain
  • Po Shan Chan, AP Infosense Limited, Hong Kong
  • Guoqing Chang, Center for Free Electron Laser Science, Germany
  • Yanne Chembo, FEMTO-ST Institute, France
  • Jing-Heng Chen, Feng Chia University, Taiwan
  • Shean-Jen Chen, National Chiao Tung University, Taiwan
  • David Chenault, Polaris Sensor Technologies, Inc., USA
  • Nan Chi, Fudan University, China
  • Chi Wai Chow, National Chiao Tung University, Taiwan
  • Jerzy Ciosek, Wojskowa Akademia Techniczna, Poland
  • Paul Colbourne, Lumentum Inc., Canada
  • Randy F. McNew Crouse, Jenoptik Optical Systems, USA
  • Giuseppe D'Aguanno, University of Texas at Austin, USA
  • Vincent Daria, Australian National University, Australia
  • Narayana Desai, University of Hyderabad, India
  • Jose Rufino Diaz-Uribe, Universidad Nacional Autonoma de Mexico, Mexico
  • Denis Donlagic, Univerza v Mariboru, Slovenia
  • Roger Dorsinville, City University of New York, USA
  • Alexandre Douplik, Ryerson University, Canada
  • Lingze Duan, University of Alabama in Huntsville, USA
  • Juergen Eschner, Universitaet des Saarlandes, Germany
  • R. Alejandro Federico, Institute Nacional de Tecnologia Industrial, Argentina
  • Simon Fleming, University of Sydney, Australia
  • Jesse Frantz, US Naval Research Laboratory, USA
  • Michael Frosz, Max Planck Institute for the Science of Light, Germany
  • Francisco Javier Gonzalez, Autonomous University of San Luis Potosi, Mexico
  • Tuan Guo, Jinan University, China
  • Pin Han, National Chung Hsing University, Taiwan
  • Carynelisa Haspel, Hebrew University of Jerusalem, Israel
  • Yoshio Hayasaki, Utsunomiya University, Japan
  • Tetsuya Hayashi, Sumitomo Electric Industries Ltd., Japan
  • Chad Husko, Argonne National Laboratory, USA
  • Kazuhiro Ikeda, AIST Tokyo, Japan
  • F. Omer Ilday, Bilkent University, Turkey
  • Alexander A.P. Iskandar, Institut Teknologi Bandung, Indonesia
  • Mark Itzler, Princeton Lightwave, Inc., USA
  • Michael Jacobson, Optical Data Associates, USA
  • Kambiz Jamshidi, Technische Universität Dresden, Germany
  • Rajan Jha, Indian Institute of Technology, Bhubaneswar, India
  • Philip Ji, NEC Laboratories America, Inc., USA
  • Xudong Jiang, Princeton Lightwave, Inc., USA
  • Igor Jovanovic, University of Michigan, USA
  • Hypolito Kalinowski, Universidade Federal Fluminense – UFF, Brazil
  • Rajan Kanhirodan, Indian Institute of Science Bangalore, India
  • Stephen Kanick, Profusa Inc., USA
  • Manoj Kanskar, nLight Photonics Corporation, USA
  • Denis Karaiskaj, University of South Florida, USA
  • Christopher Karp, Reynard Corporation, USA
  • Avi Karsenty, JCT - Lev Academic Center, Israel
  • Hamid Reza Khalesifard, Institute for Advanced Studies in Basic Sciences (IASBS), Iran
  • Seunghyun Kim, Baylor University, USA
  • Gregory Kintz, Mount Mitchell Optics, USA
  • Hiroshi Kumagai, Kitasato University, Japan
  • Arun Kumar, Indian Institute of Technology, Delhi, India
  • Nataliya Kundikova, South Ural State University, Russia
  • Matthieu Lancry, Universite de Paris-Sud XI, France
  • Francois Legare, INRS-Energie Materiaux et Telecom, Canada
  • Zachary Levine, National Institute of Standards & Technology, USA
  • Baoxin Li, Arizona State University, USA
  • Ivan Lima Jr., North Dakota State University, USA
  • Kung-Hsuan Lin, Academia Sinica, Taiwan
  • Zhili Lin, Huaqiao University, China
  • Chris Liou, Infinera Corporation, USA
  • Roberto Llorente, Universitat Politècnica de València, Spain
  • Tien-Chang Lu, National Chiao Tung University, Taiwan
  • Rosa Lukaszew, College of William and Mary, USA
  • Yuan Luo, National Taiwan University, Taiwan
  • Arkadiy Lyakh, University of Central Florida, CREOL, USA
  • Xu Ma, Beijing Institute of Technology, China
  • Nancy Magnani, Sumner School District #320, USA
  • Saurabh Mani Tripathi, Indian Institute of Technology, Kanpur, India
  • Kenneth Marshall, University of Rochester, USA
  • John McCaffrey, TA Instruments – Waters LLC, USA
  • Mehrube Mehrubeoglu, Texas A&M University Corpus Christi, USA
  • Eric Miller, Tufts University, USA
  • Joseph Miller, University of Arizona, USA
  • Igor Mokhun, Chernivtsi University, Ukraine
  • Thomas Moore, Southwest Research Institute, USA
  • Syed Murshid, Florida Institute of Technology, USA
  • Julius Muschaweck, Arnold & Richter Cine Technik GmbH & Co., Germany
  • Steven Neale, University of Glasgow, UK
  • Matthew Novak, Technical Optics, LLC, USA
  • Salah Obayya, Zewail City of Science and Technology, Egypt
  • Ali Kemal Okyay, Bilkent University, Turkey
  • Ignacio Olivares, Universidad de Santiago de Chile, Chile
  • Alexander Oraevsky, TomoWave Laboratories, Inc, USA
  • DavidParker, Parker Intellectual Property Enterprises, LLC, USA
  • Mukul Paul, Central Glass & Ceramics Res Institute, India
  • Pavel Peterka, Institute of Photonics and Electronics, Czech Republic
  • Doug Petkie, Worcester Polytechnic Institute, USA
  • Mark Phillips, Pacific Northwest National Laboratory, USA
  • Stavros Pissadakis, FORTH-IESL, Greece
  • Halina Podbielska, Wrocław University of Science and Technology, Poland
  • Chrysanthe Preza, University of Memphis, USA
  • John Prineas, University of Iowa, USA
  • Jixiong Pu, Huaqiao University, China
  • Jie Qiao, Rochester Institute of Technology, USA
  • Luca Razzari, INRS-Energie Materiaux et Telecom, Canada
  • Ingo Rimke, APE GmbH, Germany
  • Benjamin Rockwell, US Air Force, USA
  • Kevin Rodgers, Precision Laser Specialist, USA
  • Eugenio Roldán, Universitat de Valencia, Spain
  • Federico Rosei, INRS-Energie Materiaux et Telecom, Canada
  • Maitreyee Roy, University of New South Wales, Australia
  • Alex Rozhin, Aston University, UK
  • Anca Sala, Baker College, USA
  • Jose Antonio Sanchez-Gil, Consejo Sup. Investigaciones Cientificas, Spain
  • Amarendra Sarma, Indian Institute of Technology, Guwahati, India
  • Peter Schultz, Peter Schultz Consulting, LLC, USA
  • James Schwiegerling, University of Arizona, USA
  • David Sedarsky, Chalmers Tekniska Hogskola, Sweden
  • Ganapathy Senthil Murugan, University of Southampton, UK
  • Lawrence Shah, University of Central Florida, CREOL, USA
  • Craig Siders, Lawrence Livermore National Laboratory, USA
  • Rakesh Singh, Indian Institute of Space Science and Technology (IIST), India
  • Valentyn Smyntyna, Odessa National I.I. Mechnikov University, Ukraine
  • Leonid  Sokoletsky, East China Normal University, China
  • Javier Solis, Instituto De Optica CSIC, Spain
  • Volker Sorger, George Washington University, USA
  • Dmitry Starodubov, FOMS Inc., USA
  • Adrian Stern, Ben Gurion University of the Negev, Israel
  • Gregory Sun, University of Massachusetts Boston, USA
  • Qizhen Sun, Huazhong University of Science and Technology, China
  • Yuzuru Takashima, The University of Arizona, USA
  • John Tamkin, Imaging Insights LLC, USA
  • Chien-Jen Tang, Feng Chia University, Taiwan
  • Myrian Cristina Tebaldi, Centro de Investigaciones Opticas, Argentina
  • May-On Tjia, Institut Teknologi Bandung, Indonesia
  • Jens Tomm, Max Born Institute, Germany
  • Ralf-Peter Tornow, Universität Erlangen-Nürnberg, Germany
  • Todd UImer, Massachusetts Institute of Tech Lincoln Lab, USA
  • Alfred Barry U'Ren, Universidad Nacional Autonoma de Mexico, Mexico
  • Santiago Vallmitjana Rico, University of Barcelona, Spain
  • Joel Villatoro, University of the Basque Country, Spain
  • Caterina Vozzi, IFN-CNR, Italy
  • Mohamed Ridza Wahiddin, International Islamic Univ Malaysia, Malaysia
  • Zengbo Wang, Bangor University, United Kingdom
  • Zhiming Wang, University of Electronic Science and Technology of China
  • Zinan Wang, University of Electronic Science and Technology of China, China
  • Jeffrey Wilde, Stanford University, USA
  • Rachel Won, Nature Photonics, UK
  • Yiquan Wu, Alfred University, USA
  • Martijn Wubs, Danmarks Tekniske Universitet, Denmark
  • Kang Xie, Hefei University of Technology, China
  • Kazuto Yamauchi, Osaka University, Japan
  • Alexey Yamilov, Missouri University of Science & Technology, USA
  • Siavash Yazdanfar, Corning Research & Development Corporation, USA
  • Fan Zhang, Peking University, China
  • Lin Zhang, Tianjin University, China
  • Jimin Zhao, Chinese Academy of Sciences, China
  • Quan Zheng, Changchun New Industries Optoelectronics Tech.Co.,Ltd., China
  • Dmitry Zimnyakov, Saratov State Technical University, Russia
  • Weiwen Zou, Shanghai Jiao Tong University, China
  • Weiyao Zou, Archcom Technology, USA
About The Optical Society
Founded in 1916, The Optical Society (OSA) is the leading professional organization for scientists, engineers, students and entrepreneurs who fuel discoveries, shape real-life applications and accelerate achievements in the science of light. Through world-renowned publications, meetings and membership initiatives, OSA provides quality research, inspired interactions and dedicated resources for its extensive global network of optics and photonics experts. For more information, visit osa.org.

About CLEO
With a distinguished history as the industry's leading event on laser science, the Conference on Lasers and Electro-Optics (CLEO) is the premier international forum for scientific and technical optics, uniting the fields of lasers and opto-electronics by bringing together all aspects of laser technology, from basic research to industry applications. CLEO: Expo showcases the latest products and applications from more than 300 participating companies from around the world, providing hands-on demonstrations of the latest market innovations and applications. The Expo also offers valuable on-floor programming, including Market Focus and the Technology Transfer program.
 
Sponsored by The Optical Society (OSA), the American Physical Society's (APS) Laser Science Division and IEEE Photonics Society, CLEO provides the full range of critical developments in the field, showcasing the most significant milestones from laboratory to marketplace. With an unparalleled breadth and depth of coverage, CLEO connects all of the critical vertical markets in lasers and electro-optics. For more information, visit the event website at www.cleoconference.org.

Media Contacts:
mediarelations@osa.org

Share: