06 June 2016

The Optical Society Announces 2016 Class of Senior Members

06 June 2016

The Optical Society Announces 2016 Class of Senior Members

WASHINGTON — The Optical Society (OSA) Board of Directors is pleased to announce the approval of 163 new Senior Members — an OSA distinction that provides well-established individuals recognition for their experience and professional accomplishments within the field of optics and photonics. The 163 Senior Members were announced today at CLEO:2016. A listing of the newly inducted OSA Senior Members appears below.

“The Optical Society welcomes this year’s Senior Class who join a distinguished group of scientists, engineers and business leaders who have demonstrated exemplary professional accomplishments in optics and photonics,” said Alan Willner, president of The Optical Society and OSA Fellow. “Our congratulations go out to these members for their contributions to our global community.”

To qualify for Senior Membership, individuals must have at least ten years of significant professional experience in the field, an active OSA Membership and two endorsement statements from current OSA Members. Requests are reviewed by OSA’s Member and Education Services Council, which then recommends candidates to the Board of Directors for approval.
 
Senior Members receive the full complement of OSA Member benefits and services, plus:

• Special Recognitions – Senior Members are identified in the OSA Member Directory, on OSA.org and during OSA-hosted events.
• Announcements – In addition to this news release, newly-approved Senior Members are announced in:  Optics & Photonics News and the OSA Member e-newsletter.
• Senior Member Certificate and Lapel Pin – Recognition materials are distributed upon request approval.
• Letter of Recognition – Approved Senior Members may request that a confirmation letter be sent to their employer.

Following is an alphabetical listing of the 163 Senior Members announced at CLEO:2016:

• Vladimir Aksyuk, National Inst of Standards & Technology, USA
• Amin Al-Khursan, Thi-Qar University, Iraq
• Percival Almoro, University of the Philippines-Diliman, Philippines
• Farzin Amzajerdian, NASA Langley Research Center, USA
• Andrea Armani, University of Southern California, USA       
• Imrana Ashraf, Quaid-I-Azam University, Pakistan
• Clara Rivero Baleine, Lockheed Martin Corp., USA   
• Christoph Becher, Universität des Saarlandes, Germany
• Andreas Beling, University of Virginia, USA
• Yves Bellouard, Ecole Polytechnique Federale de Lausanne, Switzerland
• Aniceto Belmonte, Univ Politec de Catalunya Barcelona Tech, Spain
• Corey Bennett, Lawrence Livermore National Laboratory, USA
• Garry Berkovic, Soreq Nuclear Research Center, Israel
• Nicolò Beverini, Università degli Studi di Pisa, Italy
• Frank Beyrau, Universität Magdeburg, Germany
• Shanti Bhattacharya, IIT Madras, India
• Joerg Bischoff, Osires, Germany
• Umberto Bortolozzo, Universite de Nice Sophia Antipolis, France
• Alan Bristow, West Virginia University, USA
• Jake Bromage, University of Rochester, USA
• Douglas Brown, Raytheon ELCAN Optical Technologies, Canada
• Kristian Buchwald, Ibsen Photonics A/S, Denmark
• Liangcai Cao, Tsinghua University, China
• Román Castañeda, Universidad Nacional de Colombia, Colombia
• Shu-Wei Chang, Research Center for Applied Sciences, Taiwan
• Hongwei Chen, Tsinghua University, China
• YuBin Chen, National Cheng Kung University, Taiwan
• Daoxin Dai, Zhejiang University, China
• Prasanta  Datta, Indian Institute of Technology Kharagpur, India     
• Alberto Diaspro, Istituto Italiano di Tecnologia, Italy       
• Ivan Divliansky, University of Central Florida, CREOL, USA
• Leonid Dombrovsky, Russian Academy of Sciences, Russia
• Peter Dragic, Univ of Illinois at Urbana-Champaign, USA
• Allen Earman, AOSense, Inc., USA
• Georgios Ellinas, University of Cyprus, Cyprus
• Habib Fathallah, King Saud University, Saudi Arabia
• Mário Ferreira, Universidade de Aveiro, Portugal
• J. Michael Finlan, Northrop Grumman Corp., USA              
• Andreas Fix, Institut fuer Physik der Atmosphaere, Germany
• Keith Forsyth, USA        
• Shayan Garani, Indian Institute of Science, Bangalore, India       
• Yuriy Garbovskiy, University of Colorado, Colorado Springs, USA
• Jorge Garcia-Sucerquia, Universidad Nacional de Colombia, Colombia
• John Gillaspy, National Science Foundation, USA
• Keisuke Goda, University of Tokyo, Japan
• Lifu Gong, Oplink Communications Inc., USA
• Juliet Gopinath, University of Colorado at Boulder, USA
• Mircea Guina, Tampereen Teknillinen Yliopisto, Finland
• Brahim Guizal, Laboratoire Charles Coulomb, France           
• Huanqing Guo, Detection and Vision System, Ireland
• Khaled Habib, Materials Science & Photo-Electronics Lab, Kuwait
• Peter Hartmann, SCHOTT AG, Germany
• John Heebner, Lawrence Livermore National Laboratory, USA
• Matthias Hoffmann, SLAC National Accelerator Laboratory, USA
• Esa Jaatinen, Queensland University of Technology, Australia
• Matthias Jaeger, Institute of Photonic Technology, Germany
• Vijay Janyani, Malaviya National Institute of Tech., India
• Richard Jensen, Polatis, Inc., USA
• Jianming Jin, Univ of Illinois at Urbana-Champaign, USA
• Kyriacos Kalli, Cyprus University of Technology, Cyprus
• Søren Keiding, Aarhus University, Denmark
• Tina Kidger, Kidger Optics Associates, United Kingdom
• Johannes Kiefer, Universitat Bremen, Germany
• Alexander Kildishev, Purdue University, USA
• Jaeyoun Kim, Iowa State University, USA
• Sergey Kobtsev, Novosibirsk State University, Russia
• Peter Krug, Australia
• Anna Kudryavtseva, P.N. Lebedev Physical Institute, Russia
• Sunao Kurimura, National Institute for Materials Science, Japan
• Chee-Wei Lee, Data Storage Institute, Singapore
• Jason Lee, Rofin Sinar UK, United Kingdom
• John Lee, US Naval Research Laboratory, USA
• Sergio Leon-Saval, University of Sydney, Australia
• Renat Letfullin, Rose-Hulman Institute of Technology, USA
• Changsheng Li, Beihang University, China   
• Jianzhao Li, University of Toronto, Canada
• Yanqiu Li, Beijing Institute of Technology, China
• Chien-chung Lin, National Chiao Tung University, Taiwan
• Kurt Linden, N2 Biomedical, USA
• Dahe Liu, Beijing Normal University, China
• Jonathan Liu, University of Washington, USA
• Quan Liu, Nanyang Technological University, Singapore
• Zhengiun Liu, Harbin Institute of Technology, China
• Ter-Hoe Loh, Broadcom Limited, Singapore
• Marco Lombardo, IRCCS Fondazione G.B. Bietti, Italy
• Arkady Major, University of Manitoba, Canada
• Alejandro Martinez, Universitat Politècnica de València, Spain
• Madhavi  Martin, Oak Ridge National Laboratory, USA        
• Dalip Mehta, Indian Institute of Technology, Delhi, India
• Gabriel Mennerat, Lawrence Livermore National Laboratory, USA    
• Vinod Menon, City College of New York, USA
• Christopher Middlebrook, Michigan Technological University, USA
• Maria Millan, Universitat Politecnica de Catalunya, Spain
• Jean-Pierre Monchalin, National Research Council Canada, Canada
• Germano Montemezzani, Universite de Lorraine, France
• Linda Mullen, Naval Air Systems Command, USA
• Niru Nahar, Ohio State University, USA
• Chittur Narayanamurthy, Indian Institute of Space Sci & Tech, India
• Miguel Navarro-Cia, University of Birmingham, USA
• George Nehmetallah, Catholic University of America, USA          
• Galina Nemova, Polytechnique Montreal, Canada
• Kristian Nielsen, Danish Meteorological Institute, Denmark
• Takahiro, Ode  FOV, Japan
• Kimio Oguchi, Seikei University, Japan
• Hirotaka Ono, NTT Device Technology Laboratories, Japan
• Wounjhang (Won) Park, University of Colorado at Boulder, USA
• Helen Pask, Macquarie University, Australia
• Guido Perrone, Politecnico di Torino, Italy
• Nicholas Peters, Oak Ridge National Laboratory, USA
• Michael Pircher, Medical University of Vienna, Austria
• Pablo Postigo, Consejo Sup Investigaciones Cientificas, Spain
• Kemao Qian, Nanyang Technological University, Singapore
• Yury Rakovich, Center for Mat Physics, CSIC-UPV/EHU, Spain
• S. Anantha Ramakrishna, Indian Institute of Technology, Kanpur, India
• Danny Rich, Sun Chemical Corporation, USA
• Andre Richter, VPIphotonics, Germany
• Clara Rivero Baleine, Lockheed Martin Corp., USA   
• Martin Rochette, McGill University, Canada
• Eric Rosas-Solis, Centro de Investigaciones en Óptica, Mexico    
• Ali Rostami, University of Tabriz, Iran
• Filippus Roux, CSIR National Laser Centre, South Africa
• Brian Salzberg, University of Pennsylvania, USA
• Darryl Sanchez, US Air Force Research Laboratory, USA
• David Scherer, Microsemi, USA
• Katharine Schmidtke, Facebook, USA
• Axel Schulzgen, University of Central Florida, USA
• Thomas Seeger, Universität Siegen, Germany          
• Zouheir Sekkat, MAScIR, Morocco
• Sergey Sergeyev, Aston University, United Kingdom
• Omur Sezerman, OZ Optics Ltd, Canada
• Xiaoming Shang, Candela Corp., USA
• David Shapiro, Institute of Automation and Electrometry, Russia
• Shyh-Chiang Shen, Georgia Institute of Technology, USA
• Min-Hsiung Shih, RCAS, Academia Sinica, Taiwan
• Mehrdad Shokooh-Saremi, Ferdowsi University of Mashhad, Iran
• L. Montgomery Smith, University of Tennessee Space Institute, USA
• Marat Soskin, National Academy of Sciences of Ukraine, Ukraine
• Steven Spector, Charles Stark Draper Laboratory, USA
• Balaji Srinivasan, Indian Institute of Technology, Madras, India
• Paul Steinvurzel, The Aerospace Corporation, USA
• James Stewart, Inphi Corporation, USA
• Slawomir Sujecki, University of Nottingham, United Kingdom
• Sergey Sukhov, University of Central Florida, CREOL, USA
• Robert Tench, Cybel, LLC., USA
• Isabell Thomann, Rice University, USA
• Tim Thomas, Applied Materials. USA
• Victor Torres-Company, Chalmers Tekniska Hogskola, Sweden
• Roberto Torroba, Centro de Investigaciones en Optica AC, Argentina
• Nikolaos Tsitsas, Aristotle University of Thessaloniki, Greece
• Dmitry Turchinovich, Max Planck Inst. for Polymer Research, Germany
• Selim Unlu, Boston University, USA
• Georgios Veronis, Louisiana State University, USA
• Matias Viotti, Universidade Federal de Santa Catarina, Brazil
• Jian Wang, Huazhong University of Science and Technology, China
• Pei-Kuen Wei, Academia Sinica, Taiwan
• Christian Wetzel, Rensselaer Polytechnic Institute, USA
• Fred Whitney, Lockheed Martin Corp., USA
• Guanglin Yang, Peking University, China
• Baoli Yao, Chinese Academy of Sciences, China
• Ya Sha Yi, University of Michigan, USA
• Zhen  Yuan, University of Macau, Macau
• Patrick Yue, HKUST, Hong Kong
• Hans Zappe, University of Freiburg, Germany
• Song Zhang, Purdue University, USA

About The Optical Society
Founded in 1916, The Optical Society (OSA) is the leading professional organization for scientists, engineers, students and entrepreneurs who fuel discoveries, shape real-life applications and accelerate achievements in the science of light. Through world-renowned publications, meetings and membership initiatives, OSA provides quality research, inspired interactions and dedicated resources for its extensive global network of optics and photonics experts. For more information, visit osa.org/100.

About CLEO
With a distinguished history as the industry's leading event on laser science, the Conference on Lasers and Electro-Optics (CLEO) is the premier international forum for scientific and technical optics, uniting the fields of lasers and opto-electronics by bringing together all aspects of laser technology, from basic research to industry applications. CLEO: Expo showcases the latest products and applications from more than 300 participating companies from around the world, providing hands-on demonstrations of the latest market innovations and applications. The Expo also offers valuable on-floor programming, including Market Focus and the Technology Transfer program.
 
Managed by The Optical Society (OSA) and sponsored by the American Physical Society's (APS) Laser Science Division, IEEE Photonics Society and OSA, CLEO provides the full range of critical developments in the field, showcasing the most significant milestones from laboratory to marketplace. With an unparalleled breadth and depth of coverage, CLEO connects all of the critical vertical markets in lasers and electro-optics. For more information, visit the event website at www.cleoconference.org. Follow developments and updates on CLEO 2016 on Twitter @CLEOConf, #CLEO16.

Media Registration: A media room for credentialed press and analysts will be located on-site in the San Jose Convention Center, 5-10 June 2016. Media interested in attending the event should register on the CLEO website media center: Media Center.

Media Contacts:
mediarelations@osa.org