Invited Speakers
Plenary Speakers
8:10 a.m.–8:50 a.m.
JMA1, Better Ways to Specify Aspheric Shapes Can Facilitate Design, Fabrication and Testing Alike, Greg Forbes; QED Technologies, USA
Modifying a widely used convention is rarely easy. With designers, fabricators, and metrologists gathered here, we have a rare opportunity to consider such a change in relation to optical aspheres. This evolving technology is currently burdened by the increasingly inadequate convention of expressing a rotationally symmetric asphere’s sag as the sum of a conic component and an additive polynomial. When more than just a few terms appear in the polynomial, this becomes problematic and ultimately unworkable. Many of us are being burned by the fact that the associated coefficients are woefully unintuitive and inefficient. The norm is error-prone communications and a lack of easy options to appreciate the difficulty of manufacturing any particular asphere. Thankfully, the design and manufacture of increasingly complex aspheres is facilitated by a modified representation that is also ideal for exploiting cost-effective shapes. In particular, an orthogonalised representation gives a description that functions with fewer coefficients–typically using only one third the number of digits for current designs–and allows easy interpretations and sanity checks as well as direct assessments of manufacturability. Examples are presented to motivate us to confront this sooner rather than later.
8:50 a.m.–9:30 a.m.
JMA2, Computational Imaging Technologies, Kenneth Kubala; FiveFocal, USA
Many computational imaging technologies introduced in the last several years use optical, mechanical, sensor and computational degrees of freedom to enable special system characteristics. The general computational imaging framework will be discussed along with the value of some specific approaches. Additionally, a simplified design approach that does not require tools beyond what the designer is currently accustomed to will be described.
10:00 a.m.–10:40 a.m.
The Evolution from III-V Opto-Electronics to Silicon Nanophotonics and Vertical Cavity Lasers to Photonic Crystal and Surface Plasmon Devices, Axel Scherer, Uday Khankhoje, Tom Baehr-Jones, Se-Heon Kim; Caltech, USA
Lithography and dry etching has evolved to replace accurate crystal growth that enabled the definition of high-Q optical cavities in the past with dry etching approaches to define ultra-small mode volumes. These "printed" optical cavities can now be used to define micro- and nano-lasers in which the three-dimensional geometry is used to control the laser performance, and that can be lithographically coupled together in-plane. Advanced microcavity lasers now include photonic crystal mirrors and surface plasmon contact geometries. By combining new methods of design, fabrication and testing, it has become possible to develop higher-level abstract device design approaches that enable SPICE-like modeling of optical circuits. However, the complexity of back-reflections and the wave-like behavior of light in microfabricated geometries limit the applicability of these approaches. Here, the evolution of integrated opto-electronics into photonic crystals and plasmonics is reviewed, with an emphasis on the specific cases of miniaturized lasers, plasmonic light emitters and silicon photonics.
Illumination Design Invited Speakers
Monday
2:00 p.m.–2:30 p.m.
IMB1, A Practical and Predictive Two-Metric System for Characterizing the Color Rendering Properties of Light Sources for Architectural Applications, Mark S. Rea; Lighting Res. Ctr., Rensselaer Polytechnic Inst., USA
2:30 p.m.–3:00 p.m.
IMB2, From Enthusiasm to Economy: Precision Optical Design as a Key to Making LED Luminaires Cost-Efficient in Street Lighting and Architectural Lighting, Andreas Timinger; OEC AG, Germany
3:00 p.m.–3:30 p.m.
IMB3, Non-Visual Effects of Light: Implications for Design, Mariana Figueiro; Lighting Res. Ctr., Rensselaer Polytechnic Inst., USA,
3:30 p.m.–4:00 p.m.
IMB4, Primary Optics for LEDs–State of the Art of Optical Architectures, Julius A. Muschaweck¹, Peter Brick¹, Stefan Grötsch¹, Simon Schwalenberg²; ¹OSRAM Opto Semiconductors, Germany, ²OSRAM GmbH, Germany
Tuesday
2:00 p.m.–2:30 p.m.
ITuC1, Evolution of Illumination Systems in Microlithography-A Retrospective, Alois Herkommer; Carl Zeiss SMT AG, Germany
4:45 p.m.–5:15 p.m.
ITuE2, Fluorescence Modeling in Remote and Close LED Illumination Devices, Teus Tukker; Philips Lighting, Netherlands
Wednesday
10:45 a.m.–11:15 a.m.
IWB2, Edge-Ray and Aplanatic Designs as Special Cases of Generalized Functional Designs, John C. Bortz, Narkis Shatz; SAIC, USA
11:45 a.m.–12:15 p.m.
IWB5, Optical Design of Inhomogeneous Media to Perfectly Focus Scalar Wave Fields, Pablo Benitez, Juan C. Miñano, Juan C. González; Univ. Politecnica de Madrid, Spain
Thursday
8:15 a.m.–8:45 a.m.
IThA2, Iterative Reflector Design Using a Cumulative Flux Compensation Approach, William Cassarly; Optical Res. Associates, USA
9:00 a.m.–9:30 a.m.
IThA4, Perturbative Design of Illumination Systems, R. John Koshel¹,²; ¹Photon Engineering LLC, USA, ²College of Optical Sciences, Univ. of Arizona, USA
Optical Design Invited Speakers
Monday
10:00 a.m.–10:40 a.m.
IMA1, The Evolution from III-V Opto-Electronics to Silicon Nanophotonics and Vertical Cavity Lasers to Photonic Crystal and Surface Plasmon Devices, Axel Scherer, Uday Khankhoje, Tom Baehr-Jones, Se-Heon Kim; Caltech, USA
10:55 a.m.–11:25 a.m.
IMA3, The Power of Negative Thinking, David Shafer; David Shafer Optical Design, USA
11:25 a.m.–12:10 p.m.
IMA4, Sixth-Order Wavefront Deformations: The Coefficients and Insights into Wavefront Propagation in Optical Systems, Jose Sasian; College of Optical Sciences, Univ. of Arizona, USA
4:30 p.m.–5:00 p.m.
IMC1, Application of Radial Basis Functions to Represent Optical Free-Form Surfaces, Ozan Cakmakci¹, Ilhan Kaya², Gregory E. Fasshauer³, Kevin P. Thompson¹, Jannick P. Rolland³; ¹Optical Res. Associates, USA, ²Univ. of Central Florida, USA, ³Inst. of Optics, Univ. of Rochester, USA
5:30 p.m.–6:00 p.m.
IMC4, Large Field-of-View and High Resolution Free-Form Head-Mounted Display, Dewen Cheng¹,², Yongtian Wang¹, Hong Hua²; ¹Dept. of Optoelectronic Engineering, Beijing Inst. of Technology, China, ²3D Visualization and Imaging Systems Lab, College of Optical Sciences, Univ. of Arizona, USA
Tuesday
8:30 a.m.–9:00 a.m.
ITuA3, The 300-Year Quest for Binoculars, John Greivenkamp, David Steed; College of Optical Sciences, Univ. of Arizona, USA
11:00 a.m.–11:30 a.m.
ITuB3, Light Field Photography, Microscopy and Illumination, Marc Levoy; Stanford Univ., USA
11:45 a.m.–12:15 p.m.
ITuB5, Correcting Lateral Chromatic Aberrations by Image Processing, Akihiko Utsugi, Kenichi Ishiga; Core Technology Ctr., Nikon Corp., Japan
Wednesday
8:45 a.m.–9:15 a.m.
IWA4, Challenges for Polarization Ray Tracing, Russell A. Chipman; College of Optical Sciences, Univ. of Arizona, USA
2:00 p.m.–2:30 p.m.
IWC1, Unified Optical Modeling, Frank Wyrowski¹, Michael Kuhn²; ¹Friedrich Schiller Univ. Jena, Germany, ²LightTrans GmbH, Germany
2:45 p.m.–3:15 p.m.
IWC3, Mathematical Aspects of Laser Beam Shaping and Splitting, Louis A. Romero¹, Fred M. Dickey²; ¹Sandia Natl. Labs, USA, ²FMD Consulting, USA
3:30 p.m.–4:00 p.m.
IWC5, Microstructured Optics for Excimer-Based Systems: Applications for Imaging, Beam Shaping and Coherence Management, Robert Brunner¹,², Hans Jürgen Dobschal³, Reinhard Steiner², Matthias Burkhardt², Matthias Cumme², Oliver Sandfuchs², Dennis Lehr², Michael Helgert²; ¹Univ. of Applied Sciences Jena, Germany, ²Carl Zeiss Jena GmbH, Technology Div., Germany, ³Carl Zeiss AG, Central Res., Germany
